1990
DOI: 10.1063/1.103469
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Electronic properties of a pulse-doped GaAs structure grown by organometallic vapor phase epitaxy

Abstract: A pulse-doped GaAs structure was grown by organometallic vapor phase epitaxy using a conventional doping technique. Existence of a two-dimensional electron gas confined in this structure was confirmed by Schubnikov–de Haas measurement. Electron mobility and concentration are evaluated by Hall measurement. Electron mobility and concentration dependence on temperature of a pulse-doped GaAs are similar to those of a δ-doped GaAs.

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Cited by 14 publications
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“…Nanocrystal (NC) based ultra-dense flash memory devices are one of the most promising technologies taking advantage of nanostructures within a conventional device. Theoretically, these devices offer several advantages such as extremely low power consumption, ultra-fast data operations and excellent data storage characteristics, when compared to current technologies of non-volatile flash memories [48][49][50][51]. One common device configuration for this technology is shown in Fig.…”
Section: Non-volatile Flash Memoriesmentioning
confidence: 99%
“…Nanocrystal (NC) based ultra-dense flash memory devices are one of the most promising technologies taking advantage of nanostructures within a conventional device. Theoretically, these devices offer several advantages such as extremely low power consumption, ultra-fast data operations and excellent data storage characteristics, when compared to current technologies of non-volatile flash memories [48][49][50][51]. One common device configuration for this technology is shown in Fig.…”
Section: Non-volatile Flash Memoriesmentioning
confidence: 99%