2007
DOI: 10.1103/physrevlett.99.136801
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Electron Trapping at Point Defects on Hydroxylated Silica Surfaces

Abstract: The origin of electron trapping and negative charging of hydroxylated silica surfaces is predicted based on accurate quantum-mechanical calculations. The calculated electron affinities of the two dominant neutral paramagnetic defects, the nonbridging oxygen center, Si-O , and the silicon dangling bond, Si , demonstrate that both defects are deep electron traps and can form the corresponding negatively charged defects. We predict the structure and optical absorption energies of these diamagnetic defects.

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Cited by 47 publications
(40 citation statements)
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References 29 publications
(25 reference statements)
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“…S1). High affinities for both surface and bulk electron polaron trapping have been reported for substrates such as HfO 2 (13) and SiO 2 (14). This has been used to explain a number of surface properties, such as SiO 2 discharge phenomena, although not the surface chemistry.…”
Section: Resultsmentioning
confidence: 99%
“…S1). High affinities for both surface and bulk electron polaron trapping have been reported for substrates such as HfO 2 (13) and SiO 2 (14). This has been used to explain a number of surface properties, such as SiO 2 discharge phenomena, although not the surface chemistry.…”
Section: Resultsmentioning
confidence: 99%
“…345 For the siloxyl results show that the singly occupied orbital is mainly centered on one of the 2p orbitals of the non-bridging oxygen 345,394 and that theory is able to reproduce the essential EPR properties of these centers, 345,395 particularly when using hybrid functionals. Moreover, the overall absorption spectra calculated with time dependent DFT are in qualitative agreement with the experimental data.…”
Section: Surface Sitesmentioning
confidence: 99%
“…345,[393][394][395][396] In these cases, however, where radical species are present, the use of hybrid functionals is especially important to get accurate results.…”
Section: Dft Based Methodsmentioning
confidence: 99%
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“…19 Recent calculations have also demonstrated that the two dominant neutral paramagnetic defects at surfaces of a-SiO 2 , the non-bridging oxygen center and the silicon dangling bond, are deep electron traps and can form the corresponding negatively charged defects. 20 However, these theoretical predictions have not yet been confirmed experimentally due to challenges in identifying defect centers.…”
Section: Introductionmentioning
confidence: 99%