Abstract:Electron paramagnetic resonance ͑EPR͒ and photoluminescence ͑PL͒ spectroscopy have been used to examine the structure and optical properties of erbium-impurity complexes formed in float-zone Si by multipleenergy implants at 77 K of Er together with either O or F. After implantation a 2-m-thick amorphous layer was formed containing an almost uniform concentration of Er (10 19 /cm 3 )and O (3ϫ10 19 /cm 3 or 10 20 /cm 3 ) or F (10 20 /cm 3 ). Samples were annealed in nitrogen at 450°C for 30 min ͑treatment A͒, tr… Show more
“…In the case of line L 1 1 , the average g av value for the lowest level of the ground state is 6.1 AE 0.5, slightly smaller than the 6.8 value characteristic for pure À 6 and similar to values found for Er in different host materials [16], [67]- [70]. Therefore the lowest level of Er-1 ground state is likely to be of the À 6 character.…”
mentioning
confidence: 55%
“…Extended X-ray absorption fine structure spectroscopy [13] revealed the presence of six oxygen atoms in the immediate surrounding of the local site of an Er atom in Czochralski (Cz) Cz-Si:Er [13], [14] and 12 Si atoms in float-zoned (Fz) Fz-Si:Er. These findings were confirmed by Rutherford back-scattering [15] and electron paramagnetic resonance studies [16]. Channeling experiments by Wahl et al [17] identified the formation of an Er-related cubic center at a tetrahedral interstitial site ðT i Þ as the main center generated in c-Si by Er implantation.…”
| During the last four decades, a remarkable research effort has been made to understand the physical properties of Si:Er material, as it is considered to be a promising approach towards improving the optical properties of crystalline Si. In this paper, we present a summary of the most important results of that research. In the second part, we give a more detailed description of the properties of Si/Si:Er multinanolayer structures, which in many aspects represent the most advanced form of Er-doped crystalline Si with prospects for applications in Si photonics.
“…In the case of line L 1 1 , the average g av value for the lowest level of the ground state is 6.1 AE 0.5, slightly smaller than the 6.8 value characteristic for pure À 6 and similar to values found for Er in different host materials [16], [67]- [70]. Therefore the lowest level of Er-1 ground state is likely to be of the À 6 character.…”
mentioning
confidence: 55%
“…Extended X-ray absorption fine structure spectroscopy [13] revealed the presence of six oxygen atoms in the immediate surrounding of the local site of an Er atom in Czochralski (Cz) Cz-Si:Er [13], [14] and 12 Si atoms in float-zoned (Fz) Fz-Si:Er. These findings were confirmed by Rutherford back-scattering [15] and electron paramagnetic resonance studies [16]. Channeling experiments by Wahl et al [17] identified the formation of an Er-related cubic center at a tetrahedral interstitial site ðT i Þ as the main center generated in c-Si by Er implantation.…”
| During the last four decades, a remarkable research effort has been made to understand the physical properties of Si:Er material, as it is considered to be a promising approach towards improving the optical properties of crystalline Si. In this paper, we present a summary of the most important results of that research. In the second part, we give a more detailed description of the properties of Si/Si:Er multinanolayer structures, which in many aspects represent the most advanced form of Er-doped crystalline Si with prospects for applications in Si photonics.
“…[15] and based upon the similarities of the g values and point symmetry of centre OEr-3 to centre OEr-1, these two centres are believed to have very similar structures. However, the exact arrangement of these defect complexes within the Si lattice was unknown.…”
In a previous report, electron paramagnetic resonance measurements of erbium and oxygen implanted into silicon have revealed centres with monoclinic and trigonal symmetry.
“…It can be regarded as proven that O forms complexes with Er which directly modify the structural, electrical and optical properties of Er [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15]. However, there is also strong evidence that, possibly apart from ErO complex formation, additional mechanisms exist how O enhances the Er luminescence yield [6,7].…”
We present emission channeling experiments on the lattice location of Er in CZ Si single crystals with a well-defined O concentration of 6.5-6.6×10 17 cm -3 and 60 keV-implanted Tm+Er doses ranging from 4.3×10 12 cm -2 to 3.6×10 13 cm -2 . The experimental results are compared to the predictions of a simulator which models the formation of Er n O m clusters on the basis of simple diffusion and capture kinetics. We find that our experimental data compare favorably with a scenario where the formation of Er n O m defects with one or more O atoms is responsible for removing the Er atoms from their tetrahedral interstitial (T) sites. This suggests that Er does no longer occupy the T site even in simple (ErO) pairs.
Keywords: lattice location, Er in Si, implantation
IntroductionThe presence of O is known to increase the luminescence from Er-related centers in Si. It can be regarded as proven that O forms complexes with Er which directly modify the structural, electrical and optical properties of Er [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15]. However, there is also strong evidence that, possibly apart from ErO complex formation, additional mechanisms exist how O enhances the Er luminescence yield [6,7]. More knowledge on the composition and microscopic properties of ErO complexes can help to better understand the different mechanisms. Presently, engineering the optimum atomic neighborhood of Er in Si will be helpful in maximizing the luminescence output of Er-based light-emitting devices. As a first step in order to allow a comparison of possible scenarios of Er n O m clustering to experimental data we have developed a simulator that allows to model the interaction of Er and O during hightemperature annealing on the basis of simple diffusion and capture kinetics [14]. Previously we have compared predictions of the simulator to experimental results on the lattice location of radioactive
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