Electron-Microscopic Examination of the Surface Layer of Titanium Alloys OТ4 after Ion Implantation

Abstract

The electron microscopic and diffraction analysis presented in the article showed that the structure of the surface layer of the titanium alloy OT4 after implantation at an accelerating voltage of 30 kV from the cathode Cu-Pb-Bi has a different hierarchical character. As a result of investigations of each of the levels, it was determined experimentally that the deformation mechanism under the action of internal stresses, as well as diffusion-relaxation reactions, are the main reasons for their formation, leading to the appearance of structural features in the surface layer of the OT4 alloy. In this case, penetration of alloying components to a depth of 10-25 nm is observed.