Electron impact dissociation of H2O: emission cross sections for OH*, OH+*, H*, and H2O+* fragments

Müller, Ulrich; Bubel, T.; Schulz, Günther

doi:10.1007/bf01450171

Cited by 26 publications

(31 citation statements)

References 60 publications

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“…Studies elucidating the electron-impact excitation, ionization and dissociation of water have been conducted by many others. [17][18][19][20] At gas densities approaching atmospheric levels encountered in many practical situations, some of the excited states are quenched and do not lead to the emission of photons. Quenching in liquid water can be even more rapid.…”

Section: The Molecular Structure Of Vapor Phase Water and Its Excitatmentioning

confidence: 99%

Some Physics and Chemistry of Electrosurgical Plasma Discharges

Stalder

Woloszko

2007

Contrib. Plasma Phys.

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The physics of nonequilibrium microplasmas produced by electrical discharges in saline environments are described. Electrosurgical devices employing such discharges are finding increased use in surgical procedures requiring fine control of the tissue excision, cauterization, or debulking process. Optical spectroscopy, electrical diagnostics and gas analysis are the primary experimental methods used to study the plasmas. Water is dissociated in the plasma by electron impact processes principally into chemically‐active atomic hydrogen and hydroxyl radicals, which can subsequently interact with fibrous collagenous tissue surfaces to cut and coagulate tissue. The molecular potential energy curves of water are used to explain some features of the plasma‐induced chemistry. The Franck‐Condon principle is used to show that the fragments from electron‐impact‐dissociated water can possess excess kinetic energy, thereby enhancing their surface reactivity. Energetic electrons from the plasma can also interact directly with the tissue surface and cause fragmentation of surface proteins. Chemical kinetics simulations of water vapor periodically irradiated by energetic electrons shows that many chemical species are formed, including reactive radicals that may play a role in tissue modification useful for surgical procedures. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Section: The Molecular Structure Of Vapor Phase Water and Its Excitatmentioning

confidence: 99%

Some Physics and Chemistry of Electrosurgical Plasma Discharges

Stalder

Woloszko

2007

Contrib. Plasma Phys.

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“…Electron impact gas phase work has involved metastable fragment production [9,10], nonmetastable excited fragment production [11][12][13], and dissociative ionization and attachment [14]. A wide range of techniques has been applied including laser induced fluorescence to probe the production of unexcited fragments [15,16], and Doppler broadening of emission lines to reveal fragment kinetic energies [17,18].…”

mentioning

confidence: 99%

New Dissociation Channels inD2O

1997

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Making use of a novel solid xenon matrix detector which is selectively sensitive to O͑ 1 S 0 ͒ metastable atoms, a new dissociation channel, via a 1 A 1 repulsive state, has been uniquely identified following electron impact on D 2 O molecules. Careful measurements of the O fragment kinetic energies and appearance potentials have allowed partial reconstruction of the potential energy surface involved. The excitation function for production of O͑ 1 S 0 ͒ has a shape which is characteristic of an optically allowed transition in the parent molecule and has a maximum value of 1.2 3 10 218 cm 2 at 100 eV incident electron energy. [S0031-9007(97)

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“…Excitation energies ͑E i ͒ of these emissive neutral radicals and ionization energies of the atoms or molecules are listed in Table III. [23][24][25][26] Electron-impact dissociation mechanisms of H 2 O 25,27-30 or O 2 26,31,32 molecules had been precisely investigated on the correlated dissociation fragments and the absolute or relative, dissociation or excitation cross sections as a function of electron-impact energy. Thermochemical thresholds for the dissociation of H 2 O summarized by Müller et al 25 according to Refs.…”

Section: B Plasma Emission Monitoringmentioning

confidence: 99%

Effects of water partial pressure on the activated electron beam evaporation process to deposit tin-doped indium-oxide films

Shigesato

Yasui

Hayashi

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inEffective creation of oxygen vacancies as an electron carrier source in tin-doped indium oxide films by plasma sputtering Electrical properties and surface morphology of heteroepitaxial-grown tin-doped indium oxide thin films deposited by molecular-beam epitaxy Structure and properties of tindoped indium oxide thin films prepared by reactive electronbeam evaporation with a zoneconfining arrangementThe effects of water partial pressure ͑P H 2 O ͒ during deposition on the structural and electrical properties of tin-doped indium-oxide ͑ITO͒ films have been investigated on an activated electron beam evaporation process using an arc plasma generator. The resistivity of the films deposited at 180°C increased with an increase in P H 2 O in terms of a decrease both in Hall mobility and carrier density. X-ray diffraction and scanning electron microscope analyses showed that the ITO films deposited at higher P H 2 O consisted of a major portion of larger crystalline grains with smaller internal strain and a small portion of amorphous regions which is supposed to be at the interface between the film and the substrate. Plasma diagnostics by optical emission spectroscopy revealed that atomic hydrogen was generated by electron-impact dissociation of H 2 O and that the activation of Ar or O 2 was suppressed in the higher P H 2 O process, which resulted in the deposition of less oxidized and lower-damaged ITO films.

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Electron impact dissociation of H2O: emission cross sections for OH, OH+, H, and H2O+ fragments

Cited by 26 publications

References 60 publications

Some Physics and Chemistry of Electrosurgical Plasma Discharges

Some Physics and Chemistry of Electrosurgical Plasma Discharges

New Dissociation Channels inD2O

Effects of water partial pressure on the activated electron beam evaporation process to deposit tin-doped indium-oxide films

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