2016
DOI: 10.1134/s1063776116030055
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Electron gas induced in SrTiO3

Abstract: This mini-review is dedicated to the 85th birthday of Prof. L. V. Keldysh, from whom we have learned so much. In this paper we study the potential and electron density depth profiles in surface accumulation layers in crystals with a large and nonlinear dielectric response such as SrTiO3 (STO) in the cases of planar, spherical and cylindrical geometries. The electron gas can be created by applying an induction D0 to the STO surface. We describe the lattice dielectric response of STO using the Landau-Ginzburg fr… Show more

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Cited by 8 publications
(5 citation statements)
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“…Due to the relatively large width of this electron layer, we essentially deal with a three-dimensional system. 35,36 Such an electronic system can be described by the recent theory [37][38][39] of accumulation layers in STO based on a combination of the Landau-Ginzburg description of the dielectric response of the STO lattice and the Thomas-Fermi approximation for the degenerate electron gas. Using this theory, we show below that the three-dimensional electron density of the electronic system near the LAO/STO interface, n 3D , depends on the measured two-dimensional sheet electron density, n s , in the following way:…”
mentioning
confidence: 99%
“…Due to the relatively large width of this electron layer, we essentially deal with a three-dimensional system. 35,36 Such an electronic system can be described by the recent theory [37][38][39] of accumulation layers in STO based on a combination of the Landau-Ginzburg description of the dielectric response of the STO lattice and the Thomas-Fermi approximation for the degenerate electron gas. Using this theory, we show below that the three-dimensional electron density of the electronic system near the LAO/STO interface, n 3D , depends on the measured two-dimensional sheet electron density, n s , in the following way:…”
mentioning
confidence: 99%
“…To understand the origin of low capacitances at the buried interfaces, we calculate the carrier and potential profiles at the n -STO/undoped STO interface based on the model proposed in ref. 33 . As shown in SI Appendix , Fig.…”
Section: Resultsmentioning
confidence: 99%
“…There is a common belief that it is associated with the formation of oxygen vacancies in the SrTiO 3 substrate (in the topmost layer of TiO 2 ), occurring during the various technological steps used during film preparation, such as annealing, etching, etc. It should be noted that the formation of the electron gas at the interface with the SrTiO 3 is rather widely known phenomenon, which was studied for a long time [60]. At the same time, for FeSe/STO system this issue was not analyzed in detail and remains unexplained (see, however, recent Refs.…”
Section: Dft/lda Resultsmentioning
confidence: 99%