2013
DOI: 10.1063/1.4792057
|View full text |Cite
|
Sign up to set email alerts
|

Electron diffraction using ultrafast electron bunches from a laser-wakefield accelerator at kHz repetition rate

Abstract: International audienceWe show that electron bunches in the 50-100 keV range can be produced from a laser wake-field accelerator using 10 mJ, 35 fs laser pulses operating at 0.5 kHz. It is shown that using a solenoid magnetic lens, the electron bunch distribution can be shaped. The resulting transverse and longitudinal coherence is suitable for producing diffraction images from a polycrystalline 10 nm aluminum foil. The high repetition rate, the stability of the electron source and the fact that its uncorrelate… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
56
0

Year Published

2014
2014
2021
2021

Publication Types

Select...
6
2
1

Relationship

0
9

Authors

Journals

citations
Cited by 68 publications
(59 citation statements)
references
References 30 publications
0
56
0
Order By: Relevance
“…Recently, a first proof-of-principle experiment has shown that a few millijoule kHz system could be used to drive a laser wakefield accelerator and produce 100 keV electron beams [14]. After filtering and transport, this electron beam was used to produce clear diffraction patterns on an aluminum thin film [15]. In [15], the electron kinetic energy was limited to 100 keV because the experiment did not operate in the blowout regime.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Recently, a first proof-of-principle experiment has shown that a few millijoule kHz system could be used to drive a laser wakefield accelerator and produce 100 keV electron beams [14]. After filtering and transport, this electron beam was used to produce clear diffraction patterns on an aluminum thin film [15]. In [15], the electron kinetic energy was limited to 100 keV because the experiment did not operate in the blowout regime.…”
Section: Introductionmentioning
confidence: 99%
“…After filtering and transport, this electron beam was used to produce clear diffraction patterns on an aluminum thin film [15]. In [15], the electron kinetic energy was limited to 100 keV because the experiment did not operate in the blowout regime. In recent years, the first attempts to reach the blowout regime with mJ laser systems have been performed.…”
Section: Introductionmentioning
confidence: 99%
“…The energy of the electrons in the beams depends strongly on the laser system in use, but also on other experimental parameters, such as length and density of the interaction medium, with energies ranging from a few tens of keV [5] up to a few GeV [6]. Much effort is now focused on controlling the properties of the generated beams [7], such as the energy and number of accelerated electrons as well as the divergence and pointing, and on reducing the shot-to-shot fluctuations of these beams [8].…”
Section: Introductionmentioning
confidence: 99%
“…As shown by K. Krushelnick (U. Michigan), high repetition rate (0.5 kHz) LPAs are already being used for demonstrations of ultrafast electron diffraction applications [28]. Laser pulses with only 8 mJ, wavelength 800 nm, and pulse length 30 fs were focused in an f/2 geometry onto the gas flow from a tube of diameter 100 micron, producing stable electron beams with quasi-monoenergetic spectra up to 150 keV and charge ≈10 fC.…”
Section: Applicationsmentioning
confidence: 99%