Electron diffraction methods in TEM, STEM and SEM

Reimer, Ludwig

doi:10.1002/sca.4950020101

Cited by 38 publications

(25 citation statements)

References 44 publications

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“…In the same way, when the directions of the electron paths are reversed as in Figure 1a to give an EBSP, then the very close relationship between these two processes suggests that it is incorrect to think of two separate events, and that these must be combined in some way into a single process. Venables and Harland (1974) and on Reimer (1979 and1985). EB = electron beam, BSE = backscattered electron.…”

Section: Explanation Of Electron Channeling Patterns In Terms Of Blocmentioning

confidence: 93%

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Comparison of different models for the generation of electron backscattering patterns in the scanning electron microscope

Wells

1999

Scanning

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Summary: An electron backscattering pattern (EBSP) is formed on a fluorescent (or other) screen from the faster scattered electrons when a single-crystal region of a solid sample is illuminated by a finely focused electron beam (EB). The EBSP is very similar in appearance to the electron channeling pattern (ECP) that is obtained in the scanning electron microscope (SEM) by rocking the beam about a point on the surface of a single crystal. It has been suggested that the mechanisms that give rise to EBSP and ECP are related by reciprocity. If this is indeed the case, then the models that are used to explain them should be the same except for the direction in which the electrons travel through the specimen. The two-event "diffraction model" for EBSP (diffuse scattering followed by diffraction) fails this condition, leading to the conclusion that the "channeling in and channeling out" model for EBSP is more likely to be correct. This has been described rigorously by Reimer (1979Reimer ( , 1985. It is named after the title used by Joy (1994). An attempt is made here to describe this model in a simple way.

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Section: Explanation Of Electron Channeling Patterns In Terms Of Blocmentioning

confidence: 93%

“…This was described rigorously by Reimer (1979Reimer ( , 1985. It is named after the title used by Joy (1994).…”

Section: Introductionmentioning

confidence: 99%

Comparison of different models for the generation of electron backscattering patterns in the scanning electron microscope

Wells

1999

Scanning

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“…If the signal is collected by a detector which sub tends a small solid angle at the specimen, and can be moved relative to the sample, then contrast changes will occur in the ECP. These effects include variations in the magnitude of the contrast and even reversal in its sign (Ichinokawa et al 1974;Reimer 1979). A satisfactory theoretical treatment of these effects has not yet been presented.…”

Section: Effect Of the Take-off Angle On Ecpmentioning

confidence: 94%

Electron channeling patterns in the scanning electron microscope

Joy¹,

Newbury

Davidson

1982

Journal of Applied Physics

328

132

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A novel apparatus for in situ compression of submicron structures and particles in a high resolution SEM Rev. Sci. Instrum. 83, 095105 (2012) Foucault imaging by using non-dedicated transmission electron microscope Appl. Phys. Lett. 101, 093101 (2012) New Products Rev. Sci. Instrum. 83, 079501 (2012) Towards secondary ion mass spectrometry on the helium ion microscope: An experimental and simulation based feasibility study with He+ and Ne+ bombardment This article provides a comprehensive review of the theory, practice, and application of electron channeling patterns in the scanning electron microscope. An atlas of indexed channeling maps for the bcc, fcc, diamond cubic, and hcp systems is included with a bibliography of 240 references containing all known published work on electron channeling for crystallographic studies in the SEM.

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“…Intensity calculations in BKDPs can be carried out using the theories developed for electron channelling patterns (ECPs) (Joy 1974, Spencer et al 1972. Since ECPs and BKDPs are related by the theorem of reciprocity, intensity extrapolation between the two techniques is satisfactory (Reimer 1979). Intensity calculations across Kikuchi bands recorded from tilted samples can also be carried out using the formalism investigated by Dudarev et al (1995).…”

Section: Introductionmentioning

confidence: 99%

Measurement of crystal parameters on backscatter kikuchi diffraction patterns

Baba-Kishi

1998

Scanning

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Summary:Electron backscatter Kikuchi diffraction patterns (BKDPs) recorded in the scanning electron microscope (SEM) require measurements on the plane of the photographic film or on the recording screen. The parameters that require measurements are the equivalent electron source point on the pattern, or pattern centre, specimen-to-film distance, true interzonal angles, true interplanar angles, Bragg angles, and interplanar spacing. In this paper, the geometry and the methods of calculation of these parameters on BKDPs recorded directly on film are described in detail. The methods described are suitable for practical purposes, providing speed of calculation but limited accuracy. The inherent factors that limit the accuracy of any measurements on BKDPs are the limitations of the gnomonic projection, resulting in projected distortions in Kikuchi bands and diffuseness of Kikuchi band edges originating from inelastic scattering of electrons. The methods described are applied to crystallographic analysis of BKDPs recorded from silicon and polycrystalline copper.

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Electron diffraction methods in TEM, STEM and SEM

Cited by 38 publications

References 44 publications

Comparison of different models for the generation of electron backscattering patterns in the scanning electron microscope

Comparison of different models for the generation of electron backscattering patterns in the scanning electron microscope

Electron channeling patterns in the scanning electron microscope

Measurement of crystal parameters on backscatter kikuchi diffraction patterns

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