Electron Beam Tuning of the Magnetic Anisotropy in Co/Cu(110) Films

Reeve, Robert M.; Chin, Shin-Liang; Kopper, K. P.; Ionescu, Adrian M.; Barnes, C. H. W.

doi:10.1109/tmag.2011.2106484

Cited by 6 publications

(1 citation statement)

References 16 publications

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“…This phenomenon was explained by invoking electronic excitations and ruling out adsorbate effects . On the other hand, a recent study attributed an in-plane to in-plane SRT occurring in ultrathin Co(110) to the electron-stimulated irradiation and desorption of the adsorbed carbon monoxide, which permitted to demonstrate magnetic patterning at the millimeter scale . Yet, a microscopic proof of this concept is still missing and its mechanisms certainly deserve further investigation.…”

Section: Introductionmentioning

confidence: 99%

Magnetic Patterning by Electron Beam-Assisted Carbon Lithography

Genoni

Genuzio

Menteş

et al. 2018

ACS Appl. Mater. Interfaces

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We report on the proof of principle of a scalable method for writing the magnetic state by electron-stimulated molecular dissociative adsorption on ultrathin Co on Re(0001). Intense microfocused low-energy electron beams are used to promote the formation of surface carbides and graphitic carbon through the fragmentation of carbon monoxide. Upon annealing at the CO desorption temperature, carbon persists in the irradiated areas, whereas the clean surface is recovered elsewhere, giving origin to chemical patterns with nanometer-sharp edges. The accumulation of carbon is found to induce an in-plane to out-of-plane spin reorientation transition in Co, manifested by the appearance of striped magnetic domains. Irradiation at doses in excess of 1000 L of CO followed by ultrahigh vacuum annealing at 380 °C determines the formation of a graphitic overlayer in the irradiated areas, under which Co exhibits out-of-plane magnetic anisotropy. Domains with opposite magnetization are separated here by chiral Neél walls. Our fabrication protocol adds lateral control to spin reorientation transitions, permitting to tune the magnetic anisotropy within arbitrary regions of mesoscopic size. We envisage applications in the nano-engineering of graphene-spaced stacks exhibiting the desired magnetic state and properties.

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Section: Introductionmentioning

confidence: 99%

Magnetic Patterning by Electron Beam-Assisted Carbon Lithography

Genoni

Genuzio

Menteş

et al. 2018

ACS Appl. Mater. Interfaces

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Ab-initio calculation of C and CO adsorption on the Co (110) surface

et al. 2013

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Experimental and theoretical study of electron-beam-induced spin-reorientation transition reversal in the CO/Co(1 1 0) system

Reeve¹,

Chin²,

Kopper³

et al. 2012

J. Phys. D: Appl. Phys.

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The spin-reorientation transition (SRT) of Co films on Cu(1 1 0) due to adsorption of CO is investigated using in situ Mott polarimetry to measure the secondary electron spin polarization (SESP). The polarization along the [0 0 1] axis is found to decrease in time as the residual gas adsorbs on the surface, while the polarization along the orthogonal axis increases. By subsequently exposing the films to an electron beam for an extended period, the CO on the surface is perturbed and the process is reversed. The SESP is consequently observed to follow the opposite evolution to that seen during the initial SRT, with the SESP reverting to 83.6 ± 1.1% of its initial value after the complete reversal. Density functional theory calculations suggest that this is due to the electron-beam dissociation of the CO, leaving behind C on the cobalt surface. Furthermore, the calculations show that the C adatom results in a reduction in the SESP signal to 81% of the clean Co(1 1 0) surface, which is in good quantitative agreement with our experimental results. The experimental SESP data are also fitted to an analytical model taking into account the interaction of the electron beam with the surface adsorbate to yield an average electronic cross-section for the process of σ = (5.8 ± 1.1) × 10−18 cm2 and a strikingly small CO coverage responsible for the effect of just 0.065 ± 0.012 ML. A series of in situ magneto-optical Kerr effect measurements were also performed across the sample to show that this reversal effect is localized and confirm the ability to pattern the magnetization by locally modifying the magnetic anisotropy of the system via an electron-beam exposure.

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Electron Beam Tuning of the Magnetic Anisotropy in Co/Cu(110) Films

Cited by 6 publications

References 16 publications

Magnetic Patterning by Electron Beam-Assisted Carbon Lithography

Magnetic Patterning by Electron Beam-Assisted Carbon Lithography

Ab-initio calculation of C and CO adsorption on the Co (110) surface

Experimental and theoretical study of electron-beam-induced spin-reorientation transition reversal in the CO/Co(1 1 0) system

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