Electron-beam plasma enhancement of oxidation in thin aluminum samples

Abstract

In order to gain an insight into the effects of a space environment on materials, thin aluminum samples were exposed to an oxygen plasma produced by an electron beam. Using Rutherford backscattering spectrometry the samples exposed to the oxygen plasma were compared to samples exposed to ordinary oxygen gas. The comparison revealed a considerable increase in oxygen diffusion in the samples exposed to the charged particle environment. The amount of oxygen diffusion depends on the duration of the plasma exposure.

Electrochemical characterization of copper deposited on plasma and thermally modified titanium surfaces

“…[8] Plasma oxidation of silicon has been used in integrated circuits to form high quality insulating oxide layers. Scheider et al [9] reported that aluminum samples oxidized in plasma showed significant increases in oxygen diffusion. Plasma-treated Cu-Al alloy also enhanced the reaction rate and caused selective oxidation.…”