2016
DOI: 10.1038/micronano.2016.53
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Electron-beam lithography for polymer bioMEMS with submicron features

Abstract: We present a method for submicron fabrication of flexible, thin-film structures fully encapsulated in biocompatible polymer poly (chloro-p-xylylene) (Parylene C) that improves feature size and resolution by an order of magnitude compared with prior work. We achieved critical dimensions as small as 250 nm by adapting electron beam lithography for use on vapor deposited Parylene-coated substrates and fabricated encapsulated metal structures, including conducting traces, serpentine resistors, and nano-patterned e… Show more

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Cited by 39 publications
(33 citation statements)
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References 34 publications
(26 reference statements)
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“…Electron beam lithography is most compatible with patterning silicon or thin metal films that can dissipate the excess charge from the electrode beam ( Lee et al, 2007 ; Dalby et al, 2008 ; Scholten and Meng, 2016 ). Insulating films are more challenging to pattern with EBL because electrons that pass through the resist become trapped at the substrate surface, forming variations in resist surface potential.…”
Section: Technologies To Create Nano-architecturementioning
confidence: 99%
“…Electron beam lithography is most compatible with patterning silicon or thin metal films that can dissipate the excess charge from the electrode beam ( Lee et al, 2007 ; Dalby et al, 2008 ; Scholten and Meng, 2016 ). Insulating films are more challenging to pattern with EBL because electrons that pass through the resist become trapped at the substrate surface, forming variations in resist surface potential.…”
Section: Technologies To Create Nano-architecturementioning
confidence: 99%
“…[85] Electron-beam lithography has been proven successful in the creation of well-defined nanopatterns via local modification of hydrophobicity or functionality of the polymer surfaces. [86,87] Polymer exposure to a focused e-beam enables the creation of protein-and cell-adhesive regions with sub-100 nm resolution. [88] In contrast to the above-mentioned techniques, e-beam lithography can pattern features with arbitrary shape.…”
Section: Amorphous Polymersmentioning
confidence: 99%
“…A proximity mode inclined lithography process has been discussed where a certain gap in between the mask and the substrate is maintained and it can be used for both front side exposure and backside exposure [4]. For some Bio-MEMS applications, electron beam lithography (EBL) has been used which is able to get sub-micron feature sizes [5]. A method of multi-beam interference for fabricating 3D polymeric microstructures has also been discussed [6].…”
Section: Introductionmentioning
confidence: 99%