2021
DOI: 10.1002/mabi.202100192
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Electron‐Beam Induced Luminescence and Bleaching in Polymer Resins and Embedded Biomaterial

Abstract: Electron microscopy is crucial for imaging biological ultrastructure at nanometer resolution. However, electron irradiation also causes specimen damage, reflected in structural and chemical changes that can give rise to alternative signals. Here, luminescence induced by electron‐beam irradiation is reported across a range of materials widely used in biological electron microscopy. Electron‐induced luminescence is spectrally characterized in two epoxy (Epon, Durcupan) and one methacrylate resin (HM20) over a br… Show more

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Cited by 3 publications
(5 citation statements)
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References 28 publications
(31 reference statements)
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“…Figure S7). [20] Moreover, EDX detectors are offered in many STEM systems, which allows more widespread access and use of EDX-based ColorEM compared to CL that additionally also requires cryo temperatures during data acquisition and often more data processing. Through lanthanide substitution, the library of the immunolabels presented here is expandable, allowing multiple colours with unique (X-ray fingerprints to be used for the elucidation of structure-function relationships at the nanometer scale.…”
Section: Immunolabelling Using Colorem Label Differentiationmentioning
confidence: 99%
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“…Figure S7). [20] Moreover, EDX detectors are offered in many STEM systems, which allows more widespread access and use of EDX-based ColorEM compared to CL that additionally also requires cryo temperatures during data acquisition and often more data processing. Through lanthanide substitution, the library of the immunolabels presented here is expandable, allowing multiple colours with unique (X-ray fingerprints to be used for the elucidation of structure-function relationships at the nanometer scale.…”
Section: Immunolabelling Using Colorem Label Differentiationmentioning
confidence: 99%
“…In this SEM-based multi-color approach, spectral filters were introduced, simplifying the dual dopant recognition on the outer cell membrane, but veiling nonlocal excitations through secondary electrons were found and the obstacles associated with epoxy-embedding, required for intracellular ultrastructure assessment, were neglected. [19,20]…”
Section: Introductionmentioning
confidence: 99%
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“…The traditional way to compensate for diminished contrast is to boost the EM signal by increasing the dwell time per pixel, but this comes at the expense of throughput. An additional complication in integrated CLEM is electron-beam-induced quenching of the fluorescence ( Srinivasa Raja et al, 2021 ). This imposes the constraint that the fluorescence in a given area must be acquired prior to exposure from the electron beam, which prohibits uniformly pre-irradiating the sample with the electron beam to enhance and stabilize contrast ( Kuipers et al, 2015 ).…”
Section: Introductionmentioning
confidence: 99%