Electron-beam induced initial growth of platinum films using Pt(PF3)4

Wang, S.; Sun, Yiyong; Wang, Q.; White, J. M.

doi:10.1116/1.1761266

Cited by 51 publications

(54 citation statements)

References 12 publications

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“…This is the reason why deposits can be created from Pt(PF 3 ) 4 that contain only Pt and P atoms. 11,14,22 In addition to the effect that substrate temperature has on film composition, our results show that the binding energy of platinum atoms in the Pt(4f) region decreases systematically as the substrate temperature increases above 0 C [Figs. 2 and 5(c)], an effect which is consistent with an increase in metallic character.…”

Section: W(co)mentioning

confidence: 94%

“…% at 80 C). In another example, Wang et al showed that for EBID films created from Pt(PF 3 ) 4 in an Auger electron spectrometer the (Pt/PtþP) atomic percent increased systematically as the substrate temperature increased from 25 C to 120 C. 14 More recently, Mulders et al performed a systematic temperature dependent study on a range of EBID precursors: W(CO) 6 , TEOS, MeCpPtMe 3 , Co(CO) 3 NO, Co 2 (CO) 8 , and Me 2 Au(acac). This study revealed that increases in metallic content can occur when the substrate temperature was increased, although the importance of this processing variable depended on the precursor.…”

Section: Introductionmentioning

confidence: 99%

“…8 For example, using the Me 2 Au(tfac) precursor Koops et al showed that depositions carried out at a substrate temperature of 80 C resulted in EBID materials with lower resistivity compared to deposits created on substrates maintained at room temperature. 13 The lower resistivity was ascribed to the fact that the atomic percentage of Au in the deposits increased significantly when the substrate temperature during deposition was increased (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15) at. % at room temperature vs 70 at.…”

Section: Introductionmentioning

confidence: 99%

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Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Rosenberg

Landheer

Hagen

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Using three different precursors [MeCpPtMe 3 , Pt(PF 3 ) 4 , and W(CO) 6 ], an ultra-high vacuum surface science approach has been used to identify and rationalize the effects of substrate temperature and electron fluence on the chemical composition and bonding in films created by electron beam induced deposition (EBID). X-ray photoelectron spectroscopy data indicate that the influence of these two processing variables on film properties is determined by the decomposition mechanism of the precursor. For precursors such as MeCpPtMe 3 that decompose during EBID without forming a stable intermediate, the film's chemical composition is independent of substrate temperature or electron fluence. In contrast, for Pt(PF 3 ) 4 and W(CO) 6 , the initial electron stimulated deposition event in EBID creates surface bound intermediates Pt(PF 3 ) 3 and partially decarbonylated W x (CO) y species, respectively. These intermediates can react subsequently by either thermal or electron stimulated processes. Consequently, the chemical composition of EBID films created from either Pt(PF 3 ) 4 or W(CO) 6 is influenced by both the substrate temperature and the electron fluence. Higher substrate temperatures promote the ejection of intact PF 3 and CO ligands from Pt(PF 3 ) 3 and W x (CO) y intermediates, respectively, improving the film's metal content. However, reactions of Pt(PF 3 ) 3 and W x (CO) y intermediates with electrons involve ligand decomposition, increasing the irreversibly bound phosphorous content in films created from Pt(PF 3 ) 4 and the degree of tungsten oxidation in films created from W(CO) 6 . Independent of temperature effects on chemical composition, elevated substrate temperatures (>25 C) increased the degree of metallic character within EBID deposits created from MeCpPtMe 3 and Pt(PF 3 ) 4 .

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Section: W(co)mentioning

confidence: 94%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Rosenberg

Landheer

Hagen

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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show abstract

“…The effect of substrate heating is very strong for the Au and Pt precursors. Wang et al 62 suggested that the higher metal content at higher temperatures in their experiments is the result of the increased desorption of volatile groups. While electrons usually only affect the P-F bond ͑see also Sec.…”

Section: Substrate Heatingmentioning

confidence: 98%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

483

577

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An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied ͑current density, acceleration voltage, scan patterns, etc.͒. Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and ͑as far as possible͒ interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters ͑such as the local precursor pressure͒ are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique.

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“…10,22,[33][34][35][36][37][38] Substrate annealing during deposition decreases the residence time for both the adsorbed precursors and the volatile products of dissociation, and also effectively increases the purity of deposits formed by FEBIP. [39][40][41] Postdeposition annealing, either in situ or in the presence of a reactive species, can also result in increased deposition purity. [42][43][44][45][46] However, annealing strategies can result in physical deformation of the deposited structure, nullifying the advantages of using FEBIP to create well-defined structures with nanometer scale resolution.…”

Section: A͒mentioning

confidence: 99%

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk

Gorham

Rosenberg

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Focused electron beam induced processing ͑FEBIP͒ of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor's ligand architecture, resulting in deposits composed of metal atoms embedded in an organic matrix. To improve the metallic properties of FEBIP structures, the metal content must be improved. Toward this goal, the authors have studied the effect of atomic hydrogen ͑AH͒ and atomic oxygen ͑AO͒ on gold-containing deposits formed from the electron stimulated decomposition of the FEBIP precursor, dimethyl-͑acetylacetonate͒ gold͑III͒, Au III ͑acac͒Me 2 . The effect of AH and AO on nanometer thick gold-containing deposits was probed at room temperature using a combination of x-ray photoelectron spectroscopy ͑XPS͒, scanning Auger electron spectroscopy, and atomic force microscopy ͑AFM͒. XPS revealed that deposits formed by electron irradiation of Au III ͑acac͒Me 2 are only Ϸ10% gold, with Ϸ80% carbon and Ϸ10% oxygen. By exposing deposits to AH, all of the oxygen atoms and the majority of the carbon atoms were removed, ultimately producing a deposit composed of Ϸ75% gold and Ϸ25% carbon. In contrast, all of the carbon could be etched by exposing deposits to AO, although some gold atoms were also oxidized. However, oxygen was rapidly removed from these gold oxide species by subsequent exposure to AH, leaving behind purely metallic gold. AFM analysis revealed that during purification, removal of the organic contaminants was accompanied by a decrease in particle size, consistent with the idea that the radical treatment of the electron beam deposits produced close packed, gold particles. The results suggest that pure metallic structures can be formed by exposing metal-containing FEBIP deposits to a sequence of AO followed by AH.

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Electron-beam induced initial growth of platinum films using Pt(PF3)4

Cited by 51 publications

References 12 publications

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

A critical literature review of focused electron beam induced deposition

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

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