Electron-Beam-Induced Deposition of Platinum from a Liquid Precursor

Donev, Eugenii U.; Hastings, J. T.

doi:10.1021/nl9012216

Cited by 87 publications

(87 citation statements)

References 20 publications

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“…[19] Higher material purity has been demonstrated compared to the gas phase EBID. [15,16] With TEM/ STEM, the deposition of Pt, Ag, and PbS has been reported, [14,[20][21][22] and in this year, Grogan et al demonstrated direct writing of nanoscale Au letters using this technology. [23] Compared to the in situ SEM approach, the TEM approach offers higher in situ imaging spatial resolution (can be up to atomic resolution in liquid), and thus provides a better tool for in situ study of the material growth behaviour during EBID.…”

Section: Introductionmentioning

confidence: 97%

“…[9] Based on these developments, liquid phase electron beam induced deposition (LP-EBID) is now made possible. [8,14,15] Hastings et al [15][16][17][18] have demonstrated Pt and Au nano dot and nano wire deposition with LP-EBID in scanning electron microscope (SEM) (polyimide membranes were also used). The deposition of silver nano aggregates has also been reported in the literature.…”

Section: Introductionmentioning

confidence: 99%

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A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology

et al. 2014

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SiC x nano dots and nano wires with sizes from 60 nm to approximately 2 μm were fabricated using liquid cell transmission electron microscope (TEM) technology. A SiCl 4 in CH 2 Cl 2 solution was sealed between two pieces of Si 3 N 4 window grids in an in situ TEM liquid cell. Focused 200 keV electron beams were used to bombard the sealed precursors, which caused decomposition of the precursor materials, and deposition of the nano materials on the Si 3 N 4 window substrates. The size of nano dots increased with beam exposure time, following an approximately exponential relationship with the beam doses. Secondary electrons are attributed as the primary sources for the Si and C reduction. A nano device was formed from a deposited nano wire, with its electrical property characterized.

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Section: Introductionmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology

et al. 2014

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“…This liquid-phase electron beam induced deposition is an intriguing technique for generating micro-and nanowires with controlled sizes and patterns without the use of a mask and has been explored in this and other materials. 40,41 We now briefly discuss the limitations of the model. The data used in developing equations (4) and (5) were measured for low dose-rate irradiation (< 1000 Gy s ⁄ ).…”

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confidence: 99%

Bubble and Pattern Formation in Liquid Induced by an Electron Beam

et al. 2013

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Bubble and Pattern Formation in Liquid Induced by an Electron Beam AbstractLiquid cell electron microscopy has emerged as a powerful technique for in situ studies of nanoscale processes in liquids. An accurate understanding of the interactions between the electron beam and the liquid medium is essential to account for, suppress, and exploit beam effects. We quantify the interactions of high energy electrons with water, finding that radiolysis plays an important role, while heating is typically insignificant. For typical imaging conditions, we find that radiolysis products such as hydrogen and hydrated electrons achieve equilibrium concentrations within seconds. At sufficiently high dose-rate, the gaseous products form bubbles. We image bubble nucleation, growth, and migration. We develop a simplified reaction-diffusion model for the temporally and spatially varying concentrations of radiolysis species and predict the conditions for bubble formation by . We discuss the conditions under which hydrated electrons cause precipitation of cations from solution, and show that the electron beam can be used to "write" structures directly, such as nanowires and other complex patterns, without the need for a mask. KeywordsIn situ, electron microscopy, liquid cell, TEM, STEM, electron beam, radiation chemistry, radiolysis

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“…The minimum size of the deposit is similarly expected to be strongly dependent on the beam size and energy as well as on the ion supply. The smallest feature sizes demonstrated in optimized lithography tools for electron beam–induced deposition in liquids are in the 20- to 30-nm range ( 31 ); in STEM, feature sizes down to 40 nm have been demonstrated ( 32 ). The crystal size is controllable because the total number of ions can be specified, as shown in Fig.…”

Section: Discussionmentioning

confidence: 99%