2004
DOI: 10.1116/1.1771674
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Electron-beam evaporated cobalt films on molecular beam epitaxy prepared GaAs(001)

Abstract: We have deposited Co films on the GaAs(001) surface by using an e-beam evaporation method. The thicknesses of the Co films are measured by using x-ray reflectivity and Rutherford backscattering. The magnetic properties of the films have been measured using superconducting quantum interference device. The magnetization of the films was found to decrease with increasing film thickness. The slight degradation of magnetic properties is attributed to increasing roughness on the Co surface or the Co/GaAs interface d… Show more

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Cited by 14 publications
(8 citation statements)
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“…Nevertheless, the experimentally stabilized BCC cobalt thin films [20] were explained to originate from such imperfections or substrate lattice constant mismatch at an early stage of growth. Furthermore a critical thickness above which the BCC phase begins to transform to HCP one was identified [27]. In HCP-cobalt, our c/a ratio (1.603) and magnetic moment (1.634 µ B ) are in good agreement with experiments [18][19][20][21] and in better agreement than recent full potential calculations [25].…”
Section: Resultssupporting
confidence: 84%
“…Nevertheless, the experimentally stabilized BCC cobalt thin films [20] were explained to originate from such imperfections or substrate lattice constant mismatch at an early stage of growth. Furthermore a critical thickness above which the BCC phase begins to transform to HCP one was identified [27]. In HCP-cobalt, our c/a ratio (1.603) and magnetic moment (1.634 µ B ) are in good agreement with experiments [18][19][20][21] and in better agreement than recent full potential calculations [25].…”
Section: Resultssupporting
confidence: 84%
“…However, a rough substrate will induce some interface roughness at the interface of two materials. This has already been observed for other systems for both single layer 10 and multilayer. 4 In our samples, interface roughness should be at least of the order of a nanometer.…”
supporting
confidence: 57%
“…Values of H E and H C are 3.5 Oe and 12.4 Oe respectively, as obtained from M-H plots corresponding to both FC and ZFC (data not presented here). The small stray magnetic field which might have been present during the growth was enough to make this FM (Co) layer saturated at RT, bulk T C of Co being much greater than RT [41]. That is why every M-H loop starts with a positive M even when there is no applied filed (H = 0) in the SQUID measurements.…”
Section: Exchange Bias and Its Ion Beam Induced Evolutionmentioning
confidence: 97%
“…For the as-deposited film the magnetization is ~ 744 e.m.u./cm 3 . For bulk Co the value of magnetization is 1400 emu/cm 3 [41]. For thin films, this value is usually smaller.…”
Section: Exchange Bias and Its Ion Beam Induced Evolutionmentioning
confidence: 99%
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