1982
DOI: 10.1109/tps.1982.4316182
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Electron-Beam Controlled Discharges

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1983
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Cited by 16 publications
(6 citation statements)
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“…Energy can be stored in an inductor at low voltage, relaxing insulator design requirements and extracted on a shorter time scale at a higher power level. Present opening switch technology involves the use of explosively activated circuit breakers, 2 wire fuses,'' 3 ' 4 electron-beam (e-beam) controlled diffuse discharges, 5 and various injected plasma schemes. 6 In this paper we report experiments with a new type of opening switch which operates on a nanosecond timescale.…”
Section: Introductionmentioning
confidence: 99%
“…Energy can be stored in an inductor at low voltage, relaxing insulator design requirements and extracted on a shorter time scale at a higher power level. Present opening switch technology involves the use of explosively activated circuit breakers, 2 wire fuses,'' 3 ' 4 electron-beam (e-beam) controlled diffuse discharges, 5 and various injected plasma schemes. 6 In this paper we report experiments with a new type of opening switch which operates on a nanosecond timescale.…”
Section: Introductionmentioning
confidence: 99%
“…Discharges in gas initiated by electron beams have been studied for many decades. [1][2][3] They have a lot of useful applications in plasma chemistry and other technologies, [4][5][6] microwave electronics, [7,8] equipment of gas lasers, [9,10] etc.…”
Section: Introductionmentioning
confidence: 99%
“…Other discharge properties and mechanisms of importance in the discharge have to be considered and their collective influence on the coupling between discharge and circuit must be optimized in a different way. 0263-0346/84/0000-0000$05.00 G. Schaefer et al Recently several papers (Fernsler et al 1980;Commisso et al 1982;Commisso et al 1983;Bletzinger 1981;Hallada et al 1982;Bletzinger 1983;Kline 1982;Dzimianski & Kline 1980;Lowry et al 1983;Schoenbach et al 1982;Harjes et al 1983;Schaefer et al 1983) have appeared concerning e-beam controlled discharges. They specifically relate to switching applications, emphasizing different aspects of modes of operation, such as the influence of the gas mixture (Fernsler et al 1980;Commisso et al 1982), the cathode sheath (Hallada et al 1982;Bletzinger 1983), the low e-beam current density and high current gain regime (Kline 1982;Dzimianski & Kline 1980;Lowry et al 1983), as well as related optical control mechanisms Schaefer et al 1983).…”
Section: Introductionmentioning
confidence: 99%
“…The use of admixtures of attachers can be employed to achieve fast opening of the switch but attachment will also increase the losses (Fernsler et al 1980;Commisso et al 1982;Bletzinger 1981). It has been proposed that these switch losses can still be kept low, if the gas mixture has the following properties, allowing both low forward voltage drop and fast opening (Kristiansen & Schoenbach 1981;1982): a) at low values of E/N, i.e.…”
Section: Introductionmentioning
confidence: 99%