2018
DOI: 10.1063/1.5051724
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Electron attachment to hexafluoropropylene oxide (HFPO)

Abstract: We probe the electron attachment in hexafluoropropylene oxide, C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5× 10 −4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20-100 mbar. In the later method, the cross sections are unfolded from the electron attachment rate coefficients. The cross sections deri… Show more

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Cited by 15 publications
(8 citation statements)
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“…This process, known as dissociative electron attachment (DEA), has been reported for halogen-containing molecules and in particular for trifluoroacetic acid. [65][66][67][68][69] The resultant fragments would be F À and a difluoroacetyl radical (process (ii) in Scheme 2). Although a detailed structure of the final product cannot be inferred, XPS studies have clearly shown the presence of new F À species in the thin film after EUV exposure.…”
Section: Resultsmentioning
confidence: 99%
“…This process, known as dissociative electron attachment (DEA), has been reported for halogen-containing molecules and in particular for trifluoroacetic acid. [65][66][67][68][69] The resultant fragments would be F À and a difluoroacetyl radical (process (ii) in Scheme 2). Although a detailed structure of the final product cannot be inferred, XPS studies have clearly shown the presence of new F À species in the thin film after EUV exposure.…”
Section: Resultsmentioning
confidence: 99%
“…The errorbars shown with our experimental data express these values (only for some measurement points the uncertainty from the fitting procedure exceeds this value) which results in the slightly bigger errorbars for these cases. The PT experiment has already been described in detail in previous works [36,37], and has been used to obtain electron and ion swarm parameters in many fluorinated gases and gas mixtures [46][47][48][49][50][51][52][53][54][55][56][57][58][59] as well as in Ar, N 2 , CO 2 , O 2 , N 2 O and mixtures of those [36,37,[60][61][62][63].…”
Section: Data Acquisitionmentioning
confidence: 99%
“…C 5 F 10 Odoes not show up in figure 3(b). Zawadzki also did not detect the parent anion C 3 F 6 Oin the mass spectrum of C 3 F 6 O within EAMS [36]. Then, we detected the density of C 5 F 10 Owith different electron energies in EAMS, as shown in figure 5(b).…”
Section: Methodsmentioning
confidence: 77%