2015
DOI: 10.1063/1.4928691
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Electron attachment and positive ion chemistry of monohydrogenated fluorocarbon radicals

Abstract: Rate coefficients and product branching fractions for electron attachment and for reaction with Ar(+) are measured over the temperature range 300-585 K for three monohydrogenated fluorocarbon (HFC) radicals (CF3CHF, CHF2CF2, and CF3CHFCF2), as well as their five closed-shell precursors (1-HC2F4I, 2-HC2F4I, 2-HC2F4Br, 1-HC3F6I, 2-HC3F6Br). Attachment to the HFC radicals is always fairly inefficient (between 0.1% and 10% of the Vogt-Wannier capture rate), but generally faster than attachment to analogous perfluo… Show more

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“…We measured the kinetics of electron–radical processes and several cation reactions with the CF 3 , CH 3 , and hydrofluorocarbon radicals . That work was an extension of the variable electron and neutral density attachment mass spectrometry (VENDAMS) technique developed in our laboratory .…”
Section: Introductionmentioning
confidence: 99%
“…We measured the kinetics of electron–radical processes and several cation reactions with the CF 3 , CH 3 , and hydrofluorocarbon radicals . That work was an extension of the variable electron and neutral density attachment mass spectrometry (VENDAMS) technique developed in our laboratory .…”
Section: Introductionmentioning
confidence: 99%