Electrolytic Treatment Characteristics of Boron-doped Nanocrystalline Diamond/Amorphous Carbon Composite Films Prepared by Coaxial Arc Plasma Deposition

Abstract

Boron-doped nanocrystalline diamond/amorphous carbon composite (NCD/a-C) films were fabricated by coaxial arc plasma deposition (CAPD). Electrical conductivity measurements and thermal analysis confirmed that the deposited films exhibited p-type semiconductor behavior. Cyclic voltammetry measurements of deposited films showed a wide electrical potential window and an extremely low background current. 4-Nitrophenol (4-NP) aqueous solution, which is a recalcitrant substance, was decomposed via electrolytic treatment using a batch-type electrolytic treatment system wherein the B-doped NCD/a-C films were used as anodes. UV-vis spectra showed that the absorbance of 4-NP at 400 nm decreased with increasing electrolytic treatment time. This behavior implies that the B-doped NCD/a-C films deposited by CAPD are potential electrode materials for use in the electrolytic degradation of recalcitrant substances.

Characteristics of Electrochemical Electrodes Containing Composite Films of Boron-doped Nanocrystalline Diamond and Amorphous Carbon Prepared using a Coaxial arc Plasma Deposition Method

“…Moreover, we have previously shown that the deposited films can be used as electrodes for an electrolytic reaction that degrades 4-nitrophenol (4-NP) [23]. 4-NP is one of the recalcitrant substances in industrial effluents and is highly toxic to humans and the environment.…”