2011
DOI: 10.1149/1.3548097
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Electroless Deposition of Metallic Powders

Abstract: Deposition of metallic powders from aqueous solutions without an external current source is presented. Metallic powders can successfully be produced via galvanic displacement reaction or by electroless deposition from homogenous aqueous solutions or slurries. Formation of powders such as Cu, Ni, Co, Ag, Pd, and Au from homogenous solutions using an appropriate reducing agent or Ag via galvanic displacement reaction was demonstrated. The hydrolysis of metallic ions is a crucial step in the deposition metallic p… Show more

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Cited by 27 publications
(23 citation statements)
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“…In both cases, Ag particles were formed from complex [Ag(NH 3 ) 2 ] + ions. Simultaneously, bulbous particles of Ag are formed via galvanic displacement deposition onto aluminum surface from the ammonium solution [6,19]. On the other hand, Ag dendritic particles are formed by galvanic displacement deposition on germanium substrate from acidic Ag(I) solution at pH 2 [6,20], or in citric acid solution on an aluminum surface [6,19].…”
Section: Discussionmentioning
confidence: 99%
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“…In both cases, Ag particles were formed from complex [Ag(NH 3 ) 2 ] + ions. Simultaneously, bulbous particles of Ag are formed via galvanic displacement deposition onto aluminum surface from the ammonium solution [6,19]. On the other hand, Ag dendritic particles are formed by galvanic displacement deposition on germanium substrate from acidic Ag(I) solution at pH 2 [6,20], or in citric acid solution on an aluminum surface [6,19].…”
Section: Discussionmentioning
confidence: 99%
“…[6,[18][19][20][21]. It is necessary to note that most parameters affecting morphology of particles are the same for both electrochemical and chemical processes.…”
Section: Introductionmentioning
confidence: 99%
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“…Impurities may significantly affect the rate of many electrochemical reactions 8 including the galvanic displacement. [9][10][11][12] Additionally, the deposits are quite porous as observed for other galvanic displacement processes. 11,12 In this way, the rate of crystal growth is determined by the rate of substrate oxidation (dissolution) which is an anodic process and by the rate of metal ion reduction (deposition) which is a cathodic process.…”
Section: Resultsmentioning
confidence: 77%
“…The chemical reduction method is often referred to as electroless deposition [15,16]. Various reducing agents, such as ascorbic acid [5,8,16], hydrazine hydrate [7], sodium borohydride [6], and formaldehyde [15], are used in the chemical reduction processes. Copper, in the form of nanoparticles, can be synthesized in ethylene glycol (EG) using copper sulphate as a precursor, and vanadium sulfate as an atypical reductant [17].…”
Section: Introductionmentioning
confidence: 99%