Electroless deposition in nanotechnology and ULSI

Khoperia, Teimuraz

doi:10.1016/s0167-9317(03)00325-3

Cited by 34 publications

(42 citation statements)

References 5 publications

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“…19−21 On the basis of their reduction potentials, electroless deposition of metal ions including (but not limited to) Au 3+ , Ag + , and Cu 2+ on Si(111) surfaces is feasible. 5,6,22 Self-assembled monolayer formation allows surface chemistry modification of surfaces such as glass, SiO 2 , Al 2 O 3 , TiO 2 , or mica 23−25 using organosilanes, or metallic surfaces such as Au or Ag using organothiols. 26 Among these, silicon substrates are of particular interest here due to their many potential applications but also because they can be functionalized with silane monolayers such as octadecyltrichlorisilane (OTS) via hydration of the trichlorosilane followed by condensation with the surface hydroxyl groups.…”

Section: ■ Introductionmentioning

confidence: 99%

“…Electroless deposition of metals at interfaces is a relatively straightforward deposition method that is receiving significant attention recently due to rapid developments in the electronics, semiconductor, magnetic materials, biomedical, and nanofabrication industries. − The combination of electroless deposition with organic thin films to generate hybrid materials could potentially enhance applications of electroless metal deposition. Recent development of hybrid materials such as peptide-functionalized graphene moieties, metal organic frameworks, biological ligands capped nanoparticles, and other organometallic structures has attracted a lot of attention and promise in both commercial and fundamental applications. − Selective metal deposition on silicon substrates allows fabrication of a new class of hybrid materials with potential applications in nanoscale electronic components, high performance optoelectronic devices, highly sensitive detectors, and platforms to study biological systems. − Nevertheless, challenges in combining different materials have imposed a significant delay in the development of such devices.…”

Section: Introductionmentioning

confidence: 99%

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Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics

Ulapane

Kamathewatta

Ashberry

et al. 2019

ACS Appl. Nano Mater.

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Electroless deposition of noble metals on silicon has applications in a wide range of fields including electronic circuitry, metal plating industry, lithography, and other fabrication techniques. In addition, studies using self-assembled monolayers (SAMs) as resists for electroless deposition for controlled deposition have significant potential for aiding advancement in the fields of nanoelectronics, sensing applications, and fundamental studies. Herein, we discuss the development of appropriate plating solutions for controlled deposition of metallic gold and silver on Si(111) surfaces in the presence of an organic silane monolayer acting as a resist film for directed metal deposition to produce metal-monolayer hybrid surfaces while investigating microscopic plating trends. For this, plating solutions were optimized to deposit metal on bare silicon surfaces while avoiding deposition on the SAM protected areas. Trends in the electroless deposition of gold and silver on a Si(111) surface as a function of concentration of metal ions, NH4F, citric acid, sodium citrate, polyvinylpyrrolidone (PVP), and deposition time have been monitored under ambient conditions. The resulting surfaces were characterized using atomic force microscopy (AFM), and the stability of plating solutions was investigated by UV–vis spectroscopy. For both gold and silver, we observed an increase in metal deposition when the concentration of NH4F, citric acid, and deposition time increased. The addition of PVP and the pH of the solution were also shown to have a significant effect on the metal deposition. The octadecyltrichlorosilane (OTS) SAM films act as effective nanoscale resists when the NH4F concentration is reduced from typical plating conditions. In particular, NH4F concentrations from 0.02 to 0.50 M and metal ions concentrations from 0.001 to 0.020 M were found to allow deposition of metal nanostructures on a bare Si surface while preserving OTS protected areas.

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Section: ■ Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics

Ulapane

Kamathewatta

Ashberry

et al. 2019

ACS Appl. Nano Mater.

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“…The half metals are regarded as promising materials for spintronics [5]. The NMR spectrometer and MVP excitation technique, as well as the procedures of sample preparations are described in [4,[6][7][8][9].…”

Section: Experimental Results and Their Discussionmentioning

confidence: 99%

Timing and Spectral Diagrams of Magnetic Video-Pulse Excitation Influence on NMR Spin–Echo in Magnets

Мамниашвили

Gegechkori

Akhalkatsi

et al. 2012

J Supercond Nov Magn

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We present the first systematic study of timing and spectral diagrams of magnetic video-pulse influence on the NMR two-pulse echo in a number of magnets (ferromagnets, ferrites, half metals, intermetals). It is shown that the timing diagrams showing the dependence of two-pulse echo intensity on the temporal location of a magnetic video-pulse in respect to radio-frequency pulses and the spectral diagrams of this influence are defined mainly by the local hyperfine field anisotropy and domain walls mobility. These diagrams could be used for the identification of the nature of NMR spectra in multidomain magnetic materials and to improve the resolution capacity of the NMR method in magnets.

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“…6. In addition, there were used cobalt thin magnetic films (TMF) prepared by means of chemical metallization of quartz plates, which were annealed after the chemical vapor deposition in a vacuum at 500 C for 3-4 h, and their thickness was $2.2 lm. 12 The manganite samples La 1Àx Ca x MnO 3 ([ ¼ 0.2; 0.25) were made by using a standard solid-state reaction, 13 and the obtained powder samples annealed at 1260 C for 72 h were pressed into bars.…”

Section: Experimental Technique and Samplesmentioning

confidence: 99%

Features of influence of dc magnetic field pulses on a nuclear spin echo in magnets

Мамниашвили¹,

Gegechkori²,

Akhalkatsi

et al. 2012

Low Temperature Physics

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Signal intensities of a two-pulse nuclear spin echo as a function of parameters of dc magnetic field pulses are measured in the series of materials: Li0.5Fe2.5–xZnxO4 (x < 0.25) (enriched in 57Fe isotope to 96.8%), NiMnSb, Co2MnSi, La1–хСахMnO3 (x = 0.2; 0.25) and polycrystalline Co. Two types of dependences of these signals on a supplying time of such pulses with respect to the times of the exciting RF pulses are found. The mechanisms of influence of a domain structure and a dynamic frequency shift on the observed features of the investigated signals are discussed.

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Electroless deposition in nanotechnology and ULSI

Cited by 34 publications

References 5 publications

Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics

Controlled Electroless Deposition of Noble Metals on Silicon Substrates Using Self-Assembled Monolayers as Molecular Resists To Generate Nanopatterned Surfaces for Electronics and Plasmonics

Timing and Spectral Diagrams of Magnetic Video-Pulse Excitation Influence on NMR Spin–Echo in Magnets

Features of influence of dc magnetic field pulses on a nuclear spin echo in magnets

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