Electroless Copper Plating on a Cotton Surface: Effect of Metal Ion Ligand Stability Constant on Reduction Deposition

Abstract

Electroless plating facilitates the metallization of nonconductive substrate surfaces, and of note, the precise control of the bath stability constant influences the deposition process of metal particles. In this paper, trisodium citrate, potassium sodium tartrate, nitrogen triacetic acid, thiourea, and ethylenediamine tetraacetic acid disodium were selected as coordination agents, and the effect of the metal ion ligand stability constant on the reduction deposition was studied. Coordination bonds can be established between the Cu 2+ and O/N/S particles in the ligand because paired electrons in O/N/S hybrid orbitals tend to occupy empty Cu 2+ hybrid orbitals and establish coordination bonds. More importantly, the copper−potassium sodium tartrate ligand exhibits the lowest stability constant and lowest reduction barrier. As an exception, a consecutive Cu-plated coating with an excellent crystallinity property was deposited on the cotton surface when potassium sodium tartrate was used as the coordination agent in the plating solution. The deposition amounts are 55.2% and 74.1% after 1 and 4 h of electroless copper plating, respectively. The surface resistivity of Cu-plated cotton is 0.38 Ω/cm 2 , and additionally, the surface resistivity ratio before and after 1000 cycles fluctuated between 0.9 and 1.1, indicating that the Cu-plated cotton exhibits outstanding flexibility. In this paper, the deposition rate can be optimized by adjusting the copper particle ligand stability constant in the plating solution, aiming to achieve optimal results.