2018
DOI: 10.1016/j.matlet.2018.06.076
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Electroless copper deposition on epoxy glass substrate for electrocatalysis of formaldehyde

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Cited by 20 publications
(8 citation statements)
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“…The content of free formaldehyde in the control UF adhesive was 0.45%, and it decreased with increasing copper (II) sulfate content. This was due to the oxidation of free formaldehyde by Cu 2+ ions to form formate [ 27 , 28 ]. When 1% copper (II) sulfate was added to UF resin adhesive, the content of free formaldehyde decreased by 55%, surpassing the decrease (50%) achieved with an amine scavenger [ 10 ].…”
Section: Resultsmentioning
confidence: 99%
“…The content of free formaldehyde in the control UF adhesive was 0.45%, and it decreased with increasing copper (II) sulfate content. This was due to the oxidation of free formaldehyde by Cu 2+ ions to form formate [ 27 , 28 ]. When 1% copper (II) sulfate was added to UF resin adhesive, the content of free formaldehyde decreased by 55%, surpassing the decrease (50%) achieved with an amine scavenger [ 10 ].…”
Section: Resultsmentioning
confidence: 99%
“…The etched PLA samples were then sensitized in SnCl 2 solution for 7 min, activated in PdCl 2 solution for 3 min at room temperature, and then rinsed with DI water. The catalytic Pd atoms formed and served as reactive sites for the electroless deposition reaction to take place, whereby metal ions are reduced to metallic deposits [39].…”
Section: Sample Group A: Chemical Etching and Pd Activationmentioning
confidence: 99%
“…Electroless nickel plating on porous alumina ceramics was achieved by Zhang et al [ 17 ]. Dehchar et al successfully deposited copper films on non-conductive epoxy glass substrates by electroless plating as well [ 18 ]. Currently, many works related to electroless nickel plating have been carried out on different ceramic substrates.…”
Section: Introductionmentioning
confidence: 99%