2019
DOI: 10.1021/acsami.9b10891
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Electroforming-Free Bipolar Resistive Switching in GeSe Thin Films with a Ti-Containing Electrode

Abstract: Chalcogenide materials have been regarded as strong candidates for both resistor and selector elements in passive crossbar arrays owing to their dual capabilities of undergoing threshold and resistance switching. This work describes the bipolar resistive switching (BRS) of amorphous GeSe thin films, which used to show Ovonic threshold switching (OTS) behavior. The behavior of this new functionality of the material follows filament-based resistance switching when Ti and TiN are adopted as the top and bottom ele… Show more

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Cited by 14 publications
(15 citation statements)
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“…GeSe is a member of group-VI monochalcogenides (SnS, SnSe, GeS and GeSe), known as phosphorene analogues. [35][36][37][38] Recently, GeSe has been widely investigated in photodetectors, [39][40][41][42][43][44][45][46] ovonic threshold switching devices, [47][48][49][50] PEC water splitting, 51 gas sensors, 52 field effect transistors (FETs) [53][54][55] and photovoltaics. 33,56,57 Among these applications, GeSe displays great potential in the field of photovoltaics due to its excellent material, optical and electrical properties.…”
Section: Properties Of Gesementioning
confidence: 99%
“…GeSe is a member of group-VI monochalcogenides (SnS, SnSe, GeS and GeSe), known as phosphorene analogues. [35][36][37][38] Recently, GeSe has been widely investigated in photodetectors, [39][40][41][42][43][44][45][46] ovonic threshold switching devices, [47][48][49][50] PEC water splitting, 51 gas sensors, 52 field effect transistors (FETs) [53][54][55] and photovoltaics. 33,56,57 Among these applications, GeSe displays great potential in the field of photovoltaics due to its excellent material, optical and electrical properties.…”
Section: Properties Of Gesementioning
confidence: 99%
“…To date, GeSe is regarded as one of the best OTS materials with low OFF‐state current ( I OFF ), fast speed, high endurance, and simple composition 49–52 . Amorphous GeSe has relatively large band gap in experiment (~1.0 eV), 51 so the MGS are easy to identify even though the DFT calculation underestimates the band gap.…”
Section: Resultsmentioning
confidence: 99%
“…To date, GeSe is regarded as one of the best OTS materials with low OFF-state current (I OFF ), fast speed, high endurance, and simple composition. [49][50][51][52] Amorphous GeSe has relatively large band gap in experiment (~1.0 eV), 51 so the MGS are easy to identify even though the DFT calculation underestimates the band gap. Meanwhile, GeSe is likely to form large atomic distortions and induce sufficient defect states, and hence, it is selected as the prototype to study the OTS materials.…”
Section: Analyzing Mgs Using Conventional Toolsmentioning
confidence: 99%
“…Prominent examples are selfassembled heterostructures consisting of separated ionic/ electronic channels, 13 the artificially stacked Ta/Ta 2 O 5 :Ag/ Ru structure which is operated at low currents and voltages, 14 and the vertically aligned SrTiO 3 −Sm 2 O 3 nanoscaffolds containing spatially confined oxygen vacancies which function as conduction channels at vertical interfaces. 15 However, the hitherto-reported active layers of electroforming-free RS memory devices are limited to laterally or vertically aligned heterojunctions, deficient-abundant monolayer compounds, 16 or deliberately stacked multilayers. 17 In this work, for the first time, we explore the concept of spinodal decomposition to introduce a biphasic system with fully coherent lattice, overall chemical uniformity, and conduction-differentiated regions, to be against the longstanding stability and reliability issues of RS memory devices.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Prominent examples are self-assembled heterostructures consisting of separated ionic/electronic channels, the artificially stacked Ta/Ta 2 O 5 :Ag/Ru structure which is operated at low currents and voltages, and the vertically aligned SrTiO 3 –Sm 2 O 3 nanoscaffolds containing spatially confined oxygen vacancies which function as conduction channels at vertical interfaces . However, the hitherto-reported active layers of electroforming-free RS memory devices are limited to laterally or vertically aligned heterojunctions, deficient-abundant monolayer compounds, or deliberately stacked multilayers …”
Section: Introductionmentioning
confidence: 99%