The corrosion resistance of multilayered Sn/Ag 3 Sn films with a 30-80 nm-thick Ag layer on reflowed Sn layer (i.e., melting and resolidification of the electrodeposited Sn) on Cu alloy substrates was investigated by accelerated sulfidizing tests in (NH 4 ) 2 S x solutions and accelerated aging tests at 473 K, and compared to conventional Ag and reflowed Sn films on Cu alloy. The multilayered Sn/Ag 3 Sn films exhibited stable electrical contact resistance even after immersion in a 0.2 mL/L (NH 4 ) 2 S x solution for 120 h. In contrast, the Ag films showed ever-increasing contact resistance with immersion time and eventually failed by losing their surface electric conductivity. Moreover, the multilayered Sn/Ag 3 Sn films showed low and stable electrical contact resistance equivalent to as-plated samples even after aging at 473 K for 3000 h, whereas the conventional Ag and reflowed Sn films delivered unstable and ever-increasing contact resistances at 500 h. The excellent corrosion resistance of the multilayered Sn/Ag 3 Sn films can be mainly attributed to a thin SnO film on the intermetallic Ag 3 Sn layer, which is chemically stable in the presence of S 2− ions, and the inclusion of Ag component in Cu 6 Sn 5 /Cu 3 Sn phases by inward diffusion, which enhances the oxidation resistance of the Cu-Sn alloy during aging at high temperature.