Electrodeposition of different types of tungsten cathode deposits from ionic melts

Малышев, В. В.

doi:10.1007/s11003-011-9402-9

Cited by 8 publications

(3 citation statements)

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“…Thus, the electrodeposition of flat and dense tungsten coatings is worth investigating. Numerous studies have reported the electrodeposition of tungsten from the high-temperature molten salts, such as fluorides, 1,2 chlorides, [2][3][4] fluoride-chloride mixtures [2][3][4][5][6][7][8] and oxides. 2,3,9 It is known that dense and coherent tungsten deposits are more easily obtained from molten fluorides than from molten chlorides.…”

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“…Numerous studies have reported the electrodeposition of tungsten from the high-temperature molten salts, such as fluorides, 1,2 chlorides, [2][3][4] fluoride-chloride mixtures [2][3][4][5][6][7][8] and oxides. 2,3,9 It is known that dense and coherent tungsten deposits are more easily obtained from molten fluorides than from molten chlorides. One drawback of typical fluoride melts such as LiF-NaF-KF is the difficulty in removing the adhered molten salts by water washing because of the limited solubilities of LiF and NaF in water.…”

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Electrodeposition of Tungsten from Molten KF–KCl–WO₃ and CsF–CsCl–WO₃

Ide

Meng

Norikawa

et al. 2021

J. Electrochem. Soc.

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The electrodeposition of W films was investigated in KF-KCl eutectic melts after adding 0.5-2.0 mol% of WO6 at 923 K. Cyclic voltammetry at a Ag electrode suggested that the electrodeposition of W from W(VI) ions proceeds from 1.65 V vs. K + /K. Electrodeposition of α-W was confirmed by XRD analysis. The effect of current density and added amount of WO3 on the morphology of W films was investigated by surface and crosssectional SEM, which indicated that the best W film having thickness of ca. 15 μm was obtained at 12.5 mA cm −2 and 2.0 mol% of WO3. Although the film thickness was increased to ca. 30 μm by increasing the charge density, the surface roughness was significantly increased. To suppress the growth of crystal grains, electrodeposition of W was also investigated in CsF-CsCl eutectic melts at lower temperature of 873 K. The XRD confirmed the existences of both α-W and β-W in the W films. The SEM observations revealed that dense and smooth W films having thickness of ca. 30 μm was successfully obtained.

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Electrodeposition of Tungsten from Molten KF–KCl–WO₃ and CsF–CsCl–WO₃

Ide

Meng

Norikawa

et al. 2021

J. Electrochem. Soc.

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“…However, the electrodeposition of tungsten only can be proposed in molten salt. The common baths used for the deposition of tungsten coatings are based on halide melts [11], halide-oxide melts [12] and oxide melts [13].…”

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confidence: 99%