Electrodeposition of Al-Zr Alloys from Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt

Tsuda, Tetsuya; Hussey, Charles L.; Stafford, Gery R.; Kongstein, Ole Edvard

doi:10.1149/1.1753231

Cited by 71 publications

(61 citation statements)

References 44 publications

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“…This behavior simply reflects the fact that the anionic speciation in these ILs varies with the components' ratio. A large variety of metals and their alloys that cannot electrodeposit in conventional aqueous or organic solvents, e.g., Al, [102][103][104][105][106][107][108] Li, [109][110][111][112][113][114][115] Na, [109,[111][112][113]116,117] La, [114] AlÀMg, [118] AlÀTi, [119][120][121] AlÀZr, [122] AlÀHf, [123] AlÀV, [124] AlÀNb, [125] AlÀCr, [126][127][128][129][130][131] AlÀMo, [132] AlÀW, [123] AlÀMn, [133,134] NbÀSn, [135] AlÀNiÀCr, [136] AlÀNiÀMo, [137] AlÀMoÀMn, [138] AlÀInÀSb, [139] AlÀMoÀTi, [140] are produced from those ILs. Most deposits are nonequilibrium Al alloys.…”

Section: Electrodeposition Of Metallic/semiconducting Materialsmentioning

confidence: 99%

“…Some aluminum alloys prepared from ILs form amorphous glass phases. [122,[126][127][128][129][130][131][132][133][134][136][137][138] The properties of the aluminum alloys resulting from the electrodeposition process are virtually identical to those prepared by conventional nonequilibrium alloying methods, e.g., sputtering, melt spinning, plasma spraying, and ion implantation. These coatings show excellent corrosion resistance compared to pure Al.…”

Section: Electrodeposition Of Metallic/semiconducting Materialsmentioning

confidence: 99%

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New Frontiers in Materials Science Opened by Ionic Liquids

et al. 2010

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Ionic liquids (ILs) including ambient-temperature molten salts, which exist in the liquid state even at room temperature, have a long research history. However, their applications were once limited because ILs were considered as highly moisture-sensitive solvents that should be handled in a glove box. After the first synthesis of moisture-stable ILs in 1992, their unique physicochemical properties became known in all scientific fields. ILs are composed solely of ions and exhibit several specific liquid-like properties, e.g., some ILs enable dissolution of insoluble bio-related materials and the use as tailor-made lubricants in industrial applications under extreme physicochemical conditions. Hybridization of ILs and other materials provides quasi-solid materials, which can be used to fabricate highly functional devices. ILs are also used as reaction media for electrochemical and chemical synthesis of nanomaterials. In addition, the negligible vapor pressure of ILs allows the fabrication of electrochemical devices that are operated under ambient conditions, and many liquid-vacuum technologies, such as X-ray photoelectron spectroscopy (XPS) analysis of liquids, electron microscopy of liquids, and sputtering and physical vapor deposition onto liquids. In this article, we review recent studies on ILs that are employed as functional advanced materials, advanced mediums for materials production, and components for preparing highly functional materials.

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Section: Electrodeposition Of Metallic/semiconducting Materialsmentioning

confidence: 99%

Section: Electrodeposition Of Metallic/semiconducting Materialsmentioning

confidence: 99%

New Frontiers in Materials Science Opened by Ionic Liquids

et al. 2010

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“…These alloys are formed at or less than 0 V vs. Al(III)/Al without difficulty. Many Al alloy systems have been prepared by this route, including Al-Mg, 77 Al-Ti, [78][79][80] Al-Zr, 81 AlHf, 72 Al-V, 82 Al-Cr, [83][84][85][86][87][88] Al-Mo, 89 Al-W, 73 Al-Mn, 90,91 Al-In, 74 and Al-La. 44 It has been determined by X-ray diffraction techniques that Al-Zr, Al-Cr, Al-Mo, Al-W and Al-Mn in particular form amorphous glass phases.…”

Section: Electrodeposition Aluminum Alloys From Haloaluminate Rtilsmentioning

confidence: 99%

Review—Electrochemical Surface Finishing and Energy Storage Technology with Room-Temperature Haloaluminate Ionic Liquids and Mixtures

Tsuda

Stafford

Hussey

2017

J. Electrochem. Soc.

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In this article, we review the progress in the area of electrochemical technology with Lewis acidic haloaluminate room-temperature ionic liquids (RTILs), such as AlCl 3 -1-ethyl-3-methylimidazolium chloride and AlBr 3 -1-ethyl-3-methylimidazolium bromide, and novel chloroaluminate mixtures consisting of AlCl 3 and polarizable molecules, e.g., dimethylsulfone and urea, during this decade. The number of researchers in the field seems to increase steadily, because now we can handle haloaluminate RTILs and their mixtures with other solvents and materials more easily than we could in the past. In this review, we have categorized the electrochemical technology based on these RTILs into two topics: electroplating and energy storage. In fact, much of the current research is based on work begun during the period from ∼1970 until the 1990's. Room-temperature ionic liquids (RTILs), which is a name synonymous with room-temperature molten salts, have received considerable attention as novel reaction media, liquid materials, and starting materials for functional carbon material. (The name "ionic liquid" was arbitrarily chosen to represent what are actually salts that liquefy at temperatures below 373 K.) The interest in these materials stems from their favorable physicochemical properties, such as low-flammability, negligible vapor pressure, relatively high ionic conductivity, and high electrochemical stability. [1][2][3][4][5][6][7] It is now common knowledge in the chemistry community that many RTILs are stable in air or even water. The "first generation ionic liquids" were difficult to handle because the typical anions known at that time, e.g., AlCl 4 − and Al 2 Cl 7 − , reacted strongly with moisture in the air. Only a very limited number of laboratories with special skills for handling them could effectively use these RTILs. No doubt, the flourishing interest in RTIL chemistry was heavily abetted by the discovery of air and water stable systems, i.e., the so-called "second generation ionic liquids".However, we should not devalue the first generation systems such as those based on quaternary organic halide salts and aluminum halides, e.g., AlBr 3 and AlCl 3 , known as haloaluminates. The reactivity of the haloaluminates as well as their adjustable Lewis acidity is precisely what makes them interesting and very versatile. By contrast, the second-generation "inert" ionic liquids, are just that: inert and nonreactive, both chemically and electrochemically. Furthermore, the ionic conductivity and viscosity of the haloaluminates, which are important factors for the electrochemical applications described herein, exceed those for the comparable second-generation RTILs. For example, the ionic conductivity and viscosity for 60.0-40.0 mole percent (or 60 mol%) AlCl 3 -1-ethyl-3-methylimidazolium chloride ([C 2 mim]Cl) are 17.1 mS cm −1 and 15.35 mPa s, respectively, at 298 K.8 (In the interest of brevity, we will refer to the composition of these ionic liquids by simply stating only the amount of the aluminum halide.) On the other ...

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“…A representative ionic liquid used for the electrodeposition of Al alloys is Lewis acidic 1-ethyl-3-methylimidazolium chloride (EMIC)-AlCl 3 (where the AlCl 3 /EMIC molar ratio >1). Reports on the electrodeposition of Al alloys including Al-Ni, 13 Al-Ti, 14 Al-V, 15 Al-Zr, 16 Al-Mo, 17 Al-Mn, 18 and Al-Hf 19 are available in the literature. A previous study revealed that electrodeposition in a EMIC-AlCl 3 bath with the addition of W(IV) chloride (WCl 4 ) yielded Al-W alloys, but the W content was lower than 1 at.%.…”

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confidence: 99%

Electrodeposition of Al-W Alloy Films in a 1-Ethyl-3-methyl-imidazolium Chloride-AlCl₃Ionic Liquid Containing W₆Cl₁₂

Higashino

Miyake

Fujii

et al. 2017

J. Electrochem. Soc.

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The electrodeposition of Al-W alloy films in a Lewis acidic 1-ethyl-3-methyl-imidazolium chloride (EMIC)-AlCl 3 ionic liquid using W 6 Cl 12 as the W ion source was investigated. W 6 Cl 12 dissolved in the ionic liquid at a higher concentration than other W ion sources used in previous studies. Potentiostatic electrodeposition was performed in a bath containing W 6 Cl 12 at a concentration of 49 mM. Dense Al-W alloy films containing up to 12 at.% W were electrodeposited at potentials more negative than 0 V vs. Al/Al(III). The deposition current density at >0 V was lower than 0.3 mA cm −2 , while that for Al-W alloy films was higher and reached 38 mA cm −2 at −0.5 V. The deposition of W was induced by the deposition of Al. At lower W concentrations, the Al-W alloy films were composed of a super-saturated solid solution, and in the W content range of 9-12 at.% they comprised an amorphous phase. Potentiodynamic polarization and nano-indentation showed that the Al-W alloy films containing 10-12 at.% W exhibited high pitting corrosion resistance, high hardness, and low Young's modulus. Al metal has high oxidation and corrosion resistance, and its chloride-induced pitting corrosion resistance is enhanced by alloying with transition metals. Consequently, Al-transition metal alloys have attracted much research attention as corrosion-protective materials. Among these alloys, Al-W alloys containing approximately 10 at.% are known to exhibit the greatest resistance to pitting corrosion. 1Since the maximum solubility of W in Al phases is only 0.022 at.% at 640• C in the equilibrium state, 2 the formation of Al-W alloy films having high corrosion resistances requires non-equilibrium processes, such as sputtering, 1,3-8 ion implantation, 9 and electrodeposition. 10-12Of these methods, electrodeposition has particular advantages in that a uniform film can be formed relatively quickly and continuously, onto substrates having complex shapes, using simple equipment. Various Al-based alloy films have been electrodeposited in molten salts such as NaCl-AlCl 3 with the addition of ion sources for the alloy component. Recently, electrodeposition using ionic liquids has become more popular owing to their low melting point and low volatility. A representative ionic liquid used for the electrodeposition of Al alloys is Lewis acidic 1-ethyl-3-methylimidazolium chloride (EMIC)-AlCl 3 (where the AlCl 3 /EMIC molar ratio >1 Al-Mn, 18 and Al-Hf 19 are available in the literature. A previous study revealed that electrodeposition in a EMIC-AlCl 3 bath with the addition of W(IV) chloride (WCl 4 ) yielded Al-W alloys, but the W content was lower than 1 at.%.10 Recently, the electrodeposition of Al-W alloy films from an EMIC-AlCl 3 bath with the addition of the W(III) compound K 3 W 2 Cl 9 was reported.11,12 Although the W content of the Al-W alloys reached nearly 96 at.%, the deposits with high W content had powdery morphologies. When the current density was high (>20 mA cm −2 ), dense Al-W alloy films were obtained, but the W content decreased t...

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Electrodeposition of Al-Zr Alloys from Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt

Cited by 71 publications

References 44 publications

New Frontiers in Materials Science Opened by Ionic Liquids

New Frontiers in Materials Science Opened by Ionic Liquids

Review—Electrochemical Surface Finishing and Energy Storage Technology with Room-Temperature Haloaluminate Ionic Liquids and Mixtures

Electrodeposition of Al-W Alloy Films in a 1-Ethyl-3-methyl-imidazolium Chloride-AlCl₃Ionic Liquid Containing W₆Cl₁₂

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Electrodeposition of Al-Zr Alloys from Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt

Cited by 71 publications

References 44 publications

New Frontiers in Materials Science Opened by Ionic Liquids

New Frontiers in Materials Science Opened by Ionic Liquids

Review—Electrochemical Surface Finishing and Energy Storage Technology with Room-Temperature Haloaluminate Ionic Liquids and Mixtures

Electrodeposition of Al-W Alloy Films in a 1-Ethyl-3-methyl-imidazolium Chloride-AlCl3Ionic Liquid Containing W6Cl12

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Electrodeposition of Al-W Alloy Films in a 1-Ethyl-3-methyl-imidazolium Chloride-AlCl₃Ionic Liquid Containing W₆Cl₁₂