We have revealed for the first time
that BiVO4 photoanodes
can be used even in strong acid media by mixing organic solvents into
the electrolyte and depositing multilayers with a WO3 bottom
layer. In general, the BiVO4 photoanodes are photocorrosive,
especially in acid solutions. However, this shortcoming has been overcome
using a combination of the two aforementioned modifications. We deduced
that the contribution of each mixing organic solvent for the anti-photocorrosion
of BiVO4 in sulfuric acid solutions can be evaluated on
the basis of a new empirical indicator that incorporates molecular
density, the Hansen solubility parameter, and molecular polarizability.
Acetone and tert-butyl alcohol were especially promising
solvents for stabilizing BiVO4 in acid media. We confirmed
that the mixed organic solvents stabilized surface-emergent Bi oxide
species as a passivation layer, which was generated via multilayering
with a WO3 bottom layer. During heat treatment in the fabrication
process, W weakly diffused into the BiVO4 layer and a Bi
oxide layer was formed on the outermost surface because of the Bi
segregation that arose from the charge compensation between W6+ and V5+ in the BiVO4 lattice. The
surface Bi oxide layer, which was protected by the mixed organic solvents,
steadily served as a passivation layer for anti-photocorrosion of
the underlying BiVO4 layer. We have confirmed that the
BiVO4/WO3 photoanodes in acetone-mixed aqueous
sulfuric acid solution reliably functioned for a photoelectrochemical
reaction under simulated sunlight illumination, and photoelectrochemical
production of S2O8
2– ions
was confirmed under light irradiation at λ > 480 nm. These
results
suggest that the BiVO4-based photoanodes have significant
potential for use in acid media in conjunction with very straightforward
modifications.