The work reported here is aimed at achieving low noise microwave amplification -specifically: 20 db gain, 6 db noise figure at 10 kMc, and 1 kMc bandwidth -by using tunneling. The program has two phases running concurrently. The first is aimed at an all solid state device, the second, at using a thin film cathode in conjunction with a microwave structure.In accordance with the original work statement, the feasibility of the two approaches has been determined. Exploratory work has shown that the approaches taken in the first phase will not produce the required amplification without a long and expensive effort; accordingly, further work on this phase will be suspended. The results obtained in the second phase appear to be much more promising, and henceforward all of our efforts will be diverted to this approach.
Phase IThe program on the solid-state amplifier during this period involved (1) an examination of the metal-base transistor, (2) growth of A1 2 0 3 films by plasma oxidation, (3) fabrication and testing of MIA structures with an evaporated CdS emitter, (4) fabrication and testing of MIA structures with an evaporated CdS collector, and (5) an exploratory effort to fabricate a thin-film analogue structure.Metal-base transistor structures have been fabricated with Ge collectors, thin-film Au bases and single crystal Ge, Si, and evaporated CdS emitters. Active device behavior has been observed and reported.Plasma oxidation of Al films deposited upon Ge has been performed. The resulting oxides are different from those grown thermally or with UV stimulation. Good tunneling characteristics have not been observed.Metal-interface amplifier structures with evaporated CdS emitters have shown no improvement and still suggest that hot electrons are not involved in the current transfer mechanism.Phase II Approximately 150 test cathode structures have been produced using the methods described in previous Technical Notes.Pulsed emission current densities of up to several amperes per square centimeter have been obtained. Lifetime remains a serious problem. It is -iiibelieved, however, that with improved uniformity of the tuneling insulator satisfactory operation of the tunnel cathode over extended periods should be possible.The requirements on cathode dimensions and performance necessary to achieve 20 db gain at 10 kMc have been theoretically established. Work was performed towards fabricating emitting structures suitable for use as the cathode in such a tube.Since the tunneling insulator appears to be one of the very critical elements in the production of a suitable tunnel cathode, a study of these layers was undertaken. Work was begun using an ellipsometer for determining the thickness of such films. Steps were taken towards forming electrically stronger insulator layers. This work was aimed primarily towards the study of different methods of oxidation of aluminum; as well as forming insulator layers different from Al 2 0y 3 Experimental evidence about the distribution of emission over the emitting surface and th...