Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

Lin, Yung Sen; Chen, Po Wen; Lin, Di; Chuang, Pei Ying; Tsai, Tsung Hsien; Shiah, Yui‐Chuin; Yu, Yueh Chung

doi:10.1016/j.surfcoat.2010.07.088

Cited by 24 publications

(6 citation statements)

References 21 publications

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“…Films prepared by wet chemical methods, on the other hand, have limited EC performance in PC/LiClO 4 because the NiO x obtained is in the normal stoichiometric ratio and has some groups on the surface due to the thermal decomposition of the nickel oxide precursor. In Table 2, we compare the performance of our NiO x NP films with those reported in the literature measured in PC/LiClO 4 solution, including those prepared by magnetron sputtering, [53][54][55] e-beam evaporation, 56 electrodeposition, 57 chemical bath deposition 58 and combustion reactions. 59 It can be seen that our NiO x films have a significant improvement over most of the NiO x films prepared by other methods, highlighting the superiority of this work and the potential for commercialisation.…”

Section: Materials Advances Papermentioning

confidence: 99%

High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

et al. 2022

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Section: Materials Advances Papermentioning

confidence: 99%

High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

et al. 2022

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“…The optimal thickness of the metal layer was found to be approximately 10 nm in recent reports. 5,12) A continuous metal layer is formed and a minimum variation in the metal sheet resistance is found when the sputtered film thickness is thicker than 10 nm. In order to increase the transmittance, the thicknesses of the bottom and the top ZnO layer were adjusted to reduce the distance of equivalent admittance (y E ) and air admittance (y 0 ).…”

Section: Film Structurementioning

confidence: 99%

“…Transparent conductive oxide (TCO) films are widely used, for example, as transparent electrodes in solar cells and in liquid crystal display panels, as gas-sensitive elements in gas detector, as electrochromic devices, as electrical conductor in energy-saving windows. [1][2][3][4][5][6] Zinc oxide (ZnO) is a multipurpose material that can demonstrate photoconductive material properties, piezoelectric, acoustic-electric effect, electro-optical effect, and other characteristics covering a wide range of applications such as photodetectors, surface acoustic wave devices, gas detectors, modulators, UV emission diodes and lasers, solar batteries, and other components and devices. ZnO is an N-type semiconductor with an energy band gap of 3.2 eV and a wurtzite crystal structure.…”

Section: Introductionmentioning

confidence: 99%

Investigation on optical and electrical properties of ZnO sandwich structure with metal interlayer

Chiu¹,

Liou²,

Hsiao³

et al. 2014

Jpn. J. Appl. Phys.

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The dielectric-metal-dielectric (DMD) sandwich structure is fabricated by the RF magnetron sputtering. The effects of sputtering voltage, thickness of the metal layer, and process temperatures on the optical, crystalline structure, and electrical properties of the zinc oxide (ZnO) films were investigated by UV-vis spectrometry, X-ray diffraction and electron energy loss spectroscopy (EELS). Silver, copper and aluminum are used for the DMD sandwich metal layer in this research. The thickness of the dielectric films is decided by admittance loci analysis base on the selected metal characteristic. The optical average transmittance in the visible spectrum and bulk resistivity of the DMD with intermediate Ag layer can reach 85% and 3 ' 10 %5 Ω cm, respectively.

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“…Farklı kalınlıklı filmlerin kimyasal birikmesinde ve yöneliminde hiç fark olmadığı ortaya çıkmıştır [31]. Reaktif plazma saçtırma tekniği ile ITO altlık üzerine büyütülen NiO filmlerde Ni +2 oranının (NiO) Li + iyonları ilave edildiğinde arttığı ve Ni+3 oranının (Ni2O3) ise Li + iyonları azaldığında arttığı gözlenmektedir [33]. Yine ITO altlık üzerine kimyasal biriktirme tekniği ile büyütülen NiO ince filmlerin FTIR ölçümlerinden bir hidroksil bandı Tablo2: ITO altlık üzerine farklı tekniklerle büyütülen NiO ince filmlerinin Raman XPS ve FTIR ölçüm sonuçları.…”

Section: Introductionunclassified

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

Demir¹

2018

Pamukkale J Eng Sci

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ITO altlık üzerine geçirgen NiO (nikel oksit) ince filmler farklı katodik akımlarda elektrokimyasal büyütme tekniği ile büyütülmüştür. Büyütme sonrası filmler 350 °C'de hava ortamında 2 sa. tavlanmıştır. Xışını kırınım (XRD) örnekleri altlık üzerine büyütülen filmlerin ( 111), ( 200) ve ( 222) yönelimlere sahip tek fazlı kübik yapılı polikristal olduklarını göstermiştir. Soğurma ölçümleriyle büyütülen NiO filmlerin band aralığı 2.85 eV olarak hesaplanmıştır. 310-800 nm aralığında alınan Fotolüminesans (PL) ölçümlerinden NiO ince filmlerin üç emisyon pikine sahip olduğu görülmüştür. Taramalı elektron mikroskobu (SEM) ve atomik kuvvet mikroskobu (AFM) ile büyütülen filmlerin yüzey morfolojisi incelenmiştir. Fourier Dönüşümlü İnfrared Spektroskopi (FTIR) analizleriyle filmlerin oluşumunda Ni-O bağların titreşim modlarına sahip olduğu ortaya çıkarılmış ve filmlerin görünür bölgede %50 ile %80 arasında ortalama bir optik geçirgenliğe sahip olduğu görülmüştür. XPS ölçümleri Ni/O yönelimi ve farklı büyütme koşullarına bağlı olarak büyütülen NiO filmlerin kimyasal bağlanma durumları gibi kimyasal özelliklerini incelemek için gerçekleştirilmiştir. Raman ölçümleri elektrokimyasal olarak büyütülen NiO filmlerinin stokiyometrik olmadığını göstermiştir. Görüldüğü gibi, NiO nanoparçacıkların yoğunluğu ve morfolojisinin optoelektronik aygıtların oluşumunda oldukça önemli olduğu anlaşılmıştır.Transparent NiO thin films were growth in different cathodic currents by using electrochemical deposition technique on ITO substrates. After deposition, thin films were annealed at 350° for 2 hours in air environment. X-ray diffraction (XRD) patterns indicated that thin films growth on substrates have a single-phased cubic polycrystalline structure with orientations of ( 111), ( 200) and ( 222). Band gap of NiO films growth by using absorption measurements were calculated as 2.85 eV. The data obtained from the measurements of photoluminescence (PL) carried out between 310-800 nm, indicated that NiO thin films have three emission peaks. NiO thin films growth were investigated from the point of surface morphology by scanning electron microscopy (SEM) and atomic force microscopy (AFM). It has been revealed that there are the vibrational modes of Ni-O bonds in the formation of the films with Fourier transform infrared spectroscopy (FTIR) analysis and showed that the films have an average optical transmittance between 50% and 80% in the visible region. XPS measurements were studied to examine the chemical features as chemical bonding states of the NiO films deposited depending on Ni/O orientation and different conditions. Raman measurements displayed that the growth NiO films have not a stoichiometric nature. As seen, it has been understood that the density and morphology of NiO particles are very important in the formation optoelectronic devices.

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Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

Cited by 24 publications

References 21 publications

High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

Investigation on optical and electrical properties of ZnO sandwich structure with metal interlayer

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

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Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

Cited by 24 publications

References 21 publications

High performance NiOx nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

High performance NiOx nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

Investigation on optical and electrical properties of ZnO sandwich structure with metal interlayer

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

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Product

Resources

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High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices

High performance NiO_x nanoplatelet based films by a scrape-coating method for bifunctional electrochromic and energy storage devices