Electrochemically induced surface modifications in boron-doped diamond films: a Raman spectroscopy study

Amination of diamond film by ammonia microwave plasma treatment

“…One sharp peak at 1332 cm -1 due to sp 3 C-C bond can be observed in as-deposited diamond film, which implies that a high quality diamond film was deposited on silicon by MPCVD. After amination for 15 min, the peak in 1500 cm -1 is increased slightly, which originates from an increase in the nondiamond carbon content on the surface [15] . For the most part, however, the microstructure of the aminated diamond was not significantly affected by the treatment.…”

Diamond film growth on the Mo–Re alloy foil

“…Compared to the sample without boron, intensity of the characteristic peak for diamond at 1332 cm À 1 reduces remarkably. At the same time, new broad Raman peaks around 500 and 1220 cm À 1 becomes noticeable when the B 2 H 6 /CH 4 ratio exceeds 1%, which can be related to the locally disordered structures induced by heavy boron doping [12][13][14]. Fig.…”

Comparative study of oxidation ability between boron-doped diamond (BDD) and lead oxide (PbO2) electrodes

“…The peak shift to higher wave numbers is due to the residual compressive stress [13]. Furthermore, two obvious wide peaks appear around 1220 and 1500 cm −1 , which are originated from the Fano interaction [14] and the appearance of graphite, respectively. The conclusion is consistent with many other authors [15][16].…”