2013
DOI: 10.1016/j.electacta.2013.09.154
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Electrochemical separation of Th from ThO2 and Eu2O3 assisted by AlCl3 in molten LiCl–KCl

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Cited by 29 publications
(19 citation statements)
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“…When Al 3+ was present in the melt, the deposition of La x Al y intermetallic compounds was favorable. However, in an Al 3+ poor system, electrochemical signals for the deposition of metals could be also observed [3,10]. One reasonable explanation for this phenomenon is that the W surface could not be completely covered by the deposited Al layer, or the deposited Al layer was too thin for the inner bulk directed diffusion of all deposited La metal to form La x Al y intermetallic compounds, in an Al 3+ poor system.…”
Section: Separation Prediction By Electrochemical Behaviormentioning
confidence: 86%
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“…When Al 3+ was present in the melt, the deposition of La x Al y intermetallic compounds was favorable. However, in an Al 3+ poor system, electrochemical signals for the deposition of metals could be also observed [3,10]. One reasonable explanation for this phenomenon is that the W surface could not be completely covered by the deposited Al layer, or the deposited Al layer was too thin for the inner bulk directed diffusion of all deposited La metal to form La x Al y intermetallic compounds, in an Al 3+ poor system.…”
Section: Separation Prediction By Electrochemical Behaviormentioning
confidence: 86%
“…Similarly, peak I C belongs to the deposition of Al metal. Peaks I C1 at about À1.18 V and I C2 at À1.40 V are likely related to the formation of intermetallic compound Al 3 Th and AlTh by the co-reduction of Th 4+ and Al 3+ , according to our previous works [3,10].…”
Section: Separation Prediction By Electrochemical Behaviormentioning
confidence: 89%
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