2019
DOI: 10.1039/c8fd90059k
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Electrochemical metallization ReRAMs (ECM) - Experiments and modelling: general discussion

Abstract: Ella Gale opened discussion of the introductory lecture by Rainer Waser: At the end of your talk you introduced complementary resistance switches, which you used for binary pattern matching. Do you have any insight into how you might use these systems to do computation in the real number space? Rainer Waser answered: We are currently working on this. (2:[2]2) Ilia Valov said: From your point of view, at the moment, what are the hottest points of research in memristive cells? What are the main challenges? Raine… Show more

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Cited by 7 publications
(9 citation statements)
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“…For instance, the electroforming process for the valence change memory (VCM) based bipolar devices may be polarity dependent due to the built-in asymmetry of the contacts at the top and bottom electrode interfaces as determined by the device design and fabrication procedure 33 . In the case of chemical metallization memory (ECM) 34,35 based devices, the formation of a filament requires the electrochemical dissolution of an active electrode (usually Ag or Cu), followed by the drift of the injected metal cation clusters toward the counter electrode by a positive voltage applied to the active electrode 26,36,37 . Thus, the comparison of the response of these devices to different biasing schemes may provide valuable information for deciphering the nature of resistive switching in a material system.…”
Section: Electrical Characterizationmentioning
confidence: 99%
“…For instance, the electroforming process for the valence change memory (VCM) based bipolar devices may be polarity dependent due to the built-in asymmetry of the contacts at the top and bottom electrode interfaces as determined by the device design and fabrication procedure 33 . In the case of chemical metallization memory (ECM) 34,35 based devices, the formation of a filament requires the electrochemical dissolution of an active electrode (usually Ag or Cu), followed by the drift of the injected metal cation clusters toward the counter electrode by a positive voltage applied to the active electrode 26,36,37 . Thus, the comparison of the response of these devices to different biasing schemes may provide valuable information for deciphering the nature of resistive switching in a material system.…”
Section: Electrical Characterizationmentioning
confidence: 99%
“…with I being the identity matrix of appropriate size. In eqn (8) and (9) the GFs are different, namely retarded (G R ), advanced (G A ), lesser (G < ), and greater (G > ), and the inuence of I nj is indirectly accounted for in the lesser and greater boundary selfenergy S +,B (E). The advanced GF is the Hermitian transposition of the retarded GF, i.e.…”
Section: Ballistic Transportmentioning
confidence: 99%
“…Eqn (8) and (9) are known as the non-equilibrium Green's function (NEGF) formalism. 12 Intuitively, the lesser (greater) boundary self-energy, S B,+ (E), indicates the probability that a state gets lled (S B,< (E)) or emptied (S B,> (E)) through interactions with the contact.…”
Section: Ballistic Transportmentioning
confidence: 99%
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