Electrochemical Deposition of Sol–Gel Films

Abstract

Electrochemical deposition of sol-gel films has been developed for preparing sol-gel films since it was first clearly proposed in 1999. It is an indirect electrochemical deposition process, where the sol-gel film formation is catalyzed by electrochemically generated OH À or H + ions on the electrodes. Thus, it has merits

Voltammetric and microscopic characteristics of MnO2 and silica-MnO2hybrid films electrodeposited on the surface of planar electrodes

“…On the other hand, sol-gel-derived silica films can be generated on solid electrodes by the electrochemically-assisted deposition (EAD) method, which is also a convenient procedure for the immobilization and holding of nanoparticles and enzymes onto electrode surfaces [30][31][32][33][34][35][36][37]. The method is easy to use, it is quick and it allows to control the thickness and surface characteristics of SiO2 on the electrode by adjusting the time and value of applied potential [37][38][39][40].…”