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2015
DOI: 10.1002/maco.201508508
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Electrochemical behaviour in synthetic saliva of silane coated Ni/Cu/Ni Nd‐Fe‐B magnet for dentistry applications

Abstract: In this work the electrochemical behaviour in synthetic saliva of silane coated Ni/Cu/Ni Nd-Fe-B magnets for dentistry applications was assessed. A protective multilayer of N-propyl-trimethoxy-silane was deposited by dip-coating onto Ni/Cu/Ni Nd-Fe-B magnets. The corrosion process of the silanised magnets was experimentally studied by polarization and electrochemical impedance spectroscopy tests performed at increasing immersion time in synthetic saliva solution. The Ni/Cu/Ni plated cover is not able to provid… Show more

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Cited by 6 publications
(3 citation statements)
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“…e capacitive reactance arc corresponds to the process of ions passing through the MAO coating, and the inductive arc corresponds to the desorption process of the adsorbed intermediate products [40][41][42]. Figure 9 presents the equivalent circuit used to simulate the EIS data, in which CPE f is the capacitance of the MAO coating, R pore is the resistance of defects, C dl is the double layer capacitance, R p is the polarization resistance, L is the inductive resistance, and R L is the inductive resistance, which is related to the active dissolution of MAO coating [43]. e fitted parameters in the equivalent circuit in Figure 9 are given in Table 3.…”
Section: Mao Coatingmentioning
confidence: 99%
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“…e capacitive reactance arc corresponds to the process of ions passing through the MAO coating, and the inductive arc corresponds to the desorption process of the adsorbed intermediate products [40][41][42]. Figure 9 presents the equivalent circuit used to simulate the EIS data, in which CPE f is the capacitance of the MAO coating, R pore is the resistance of defects, C dl is the double layer capacitance, R p is the polarization resistance, L is the inductive resistance, and R L is the inductive resistance, which is related to the active dissolution of MAO coating [43]. e fitted parameters in the equivalent circuit in Figure 9 are given in Table 3.…”
Section: Mao Coatingmentioning
confidence: 99%
“…e capacitive reactance arc corresponds to the process of ions passing through the MAO coating [43]. e bias line at low frequency corresponds to the diffusion process of Cl - through the MAO coating [44].…”
Section: Mao Coatingmentioning
confidence: 99%
See 1 more Smart Citation