Electrochemical behaviors of Indium

Abstract

Many researchers focus on indium contained semiconductors and alloy compounds for their various applications. Electrochemists want to obtain indium contained compounds simply via one-step electrodeposition. First of all, electrochemistry of constituent elements must be understood in order to develop the best condition for the electrodeposition of indium contained compounds. We will review the electrochemistry of indium. Equilibria between indium metal and indium ions and the standard electrode potentials of the equilibria will be reviewed. The electrochemical reactions of indium species are affected by surrounding conditions. Thus dependences of electrochemical behaviors of indium metal and indium ions on various parameters will be reviewed.

Free indium concentration determined with AGNES

“…Indium is a critical element present in a huge number of electronic devices (Abbas and 40 Amer, 2013; Chung and Lee, 2012;Wood and Samson, 2006), from which it will 41 eventually leach towards environmental waters and other compartments (White and 42 Hemond, 2012;Zimmermann et al, 2013). To understand these fluxes from the 43 anthroposphere to the hydrosphere, lithosphere and biosphere, the relevant chemical 44…”

Electrochemical Atomic Layer Deposition of CuInSe2 on Au Surface

“…The cathodic peak current observed between −0.1 and −0.2 V at the scan rates from 10 to 100 mV/s depended almost linearly on the scan rate as is shown in the inset of the Figure , suggesting that the pair of the cathodic and anodic peaks originate from the surface processes or In UPD and stripping of it. The present result is the first observation of In UPD process at the surface of Au electrode . The deposition potentials from −0.56 to −0.50 V were selected on the basis of the CV in Figure , which is much less negative than that, −0.7 V, employed in the previous reports …”

“…The present result is the first observation of In UPD process at the surface of Au electrode . The deposition potentials from −0.56 to −0.50 V were selected on the basis of the CV in Figure , which is much less negative than that, −0.7 V, employed in the previous reports …”

“…Unlike the cases of Cu and Se, electrochemistry of In is rather less well defined in the literature 31,[34][35][36][37][38]41,42 and is presented here. Figure 1 shows the CV at the surface of the Au electrode in an aqueous electrolyte solution of 0.5 mM In 2 (SO 4 ) 3 •xH 2 O and 0.1 M NaClO 4 solution at pH 3.…”

“…31,[34][35][36][37][38]41,42 The deposition potentials from −0.56 to −0.50 V were selected on the basis of the CV in Figure 1, which is much less negative than that, −0.7 V, employed in the previous reports. 34,35,38 The potentials chosen in this experiment were different from those by Stickney et al and optimized to produce the stoichiometric film within the potential range mentioned in the above. In the present work, mainly the superlattice program of 3(In a Se b ) + 1(Cu c Se d ) was adopted with the deposition times of 5, 15, and 30 s for Cu, In, and Se, respectively, because it gave better results than others tested in our preliminary experiments.…”