2000
DOI: 10.1016/s0013-4686(00)00426-6
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Electrochemical aspects of CdTe growth on the face (111) of silver by ECALE

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Cited by 68 publications
(47 citation statements)
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“…In ECALE, surface limited reaction means under potential deposition (UPD), which involves a formation of up to a monolayer of atoms on foreign substrates at potentials positive from the reversible Nernst potential in the same solution. Presently IIB-VIA compounds such as CdTe [6][7][8] , CdSe [9] and ZnSe [10] , and IIIA-VA compounds such as GaAs [11] , InAs [12] and InAs/InSb [13] have been studied by ECALE. In the previous work, we have already studied the formation of Bi 2 Te 3 by ECALE successfully [14,15] .…”
mentioning
confidence: 99%
“…In ECALE, surface limited reaction means under potential deposition (UPD), which involves a formation of up to a monolayer of atoms on foreign substrates at potentials positive from the reversible Nernst potential in the same solution. Presently IIB-VIA compounds such as CdTe [6][7][8] , CdSe [9] and ZnSe [10] , and IIIA-VA compounds such as GaAs [11] , InAs [12] and InAs/InSb [13] have been studied by ECALE. In the previous work, we have already studied the formation of Bi 2 Te 3 by ECALE successfully [14,15] .…”
mentioning
confidence: 99%
“…Regarding CdTe, cyclic voltammetry showed two peaks related to the reductive UPD of the HTeO 2 + on Au(111), and they occur at potential too positive to be easily observed on Ag(111) due to its narrower electrochemical stability window. They are related to a complex chemistry well explained in the literature [16]; hence, it is necessary to use a scheme similar to the CdSe growth. The charge deposited for the first Te layer on Ag(111) is equal to that found on the first UPD of Te on Au(111), for which a (12 × 12) structure was revealed by STM images as well as by low-energy electron diffraction (LEED) patterns.…”
Section: Other Cd-based Chalcogenidesmentioning
confidence: 99%
“…Indeed, we have used ECALE to successfully obtain a number of binary and ternary semiconductor thin films. These compounds include cadmium sulfide (CdS), 7-11 cadmium telluride (CdTe), 12 cadmium selenide (CdSe), 13 zinc sulfide (ZnS), 14 zinc selenide (ZnSe), 14 nickel sulfide (NiS), 15 lead sulfide (PbS), [16][17][18] copper sulfide (CuS), 19,20 and indium arsenide (InAs). 21 A specific need in our field of work is for the structural characterization-with the use of opportunistic analytical techniques-of the ultra-thin films that are obtained from the electrochemical deposition techniques.…”
Section: 1117/21201512006249 Page 2/3mentioning
confidence: 99%