Electro‐optical properties of InGaAs layers grown by hydride vapour phase epitaxy

Abstract

A series of epitaxial layers of the InGaAs alloy were deposited on (001) oriented InP substrates by using hydride VPE technique. The layers were characterized by Double Crystal Diffractometry (DCD), Photoluminescence (PL), Hall effect and Capacitance-Voltage (C-V) measurements. The growth parameters and the quality of the grown layers are discussed on the basis of electrical and structural data analysis.