2012
DOI: 10.1002/adma.201201453
|View full text |Cite
|
Sign up to set email alerts
|

Electrically Tunable Organic Distributed Feedback Lasers Embedding Nonlinear Optical Molecules

Abstract: The emission of polymer distributed feedback lasers is tuned by integrating nonlinear optical organics. The nonlinearity allows reversible tuning of the amplified spontaneous emission of a conjugated polymer by 30 nm, and the lasing wavelength by 17 nm, with a lasing tunability coefficient of 0.17 nm/V.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
27
0

Year Published

2013
2013
2018
2018

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 45 publications
(27 citation statements)
references
References 35 publications
0
27
0
Order By: Relevance
“…Master gratings were defi ned using a Leo 1530/Raith Elphy Plus system in an electron-beam resist (ZEON ZEP 520A), which was spin-coated on top of a silicon wafer. The electronbeam resist was developed using xylene at 23 ° C and the pattern (1 mm × 1 mm total area) was transferred into the silicon master using reactive ion etching (RIE) with a combination of SF 6 and CHF 3 gas (at a 1:1 ratio). The resulting master structures were transferred onto a silica substrate using UV-nanoimprint lithography by creating a perfl uoropolyether daughter stamp from the master structure and then using that as a mold for replicating the structures onto a photoresist (Micro Resist Technology UVCur06), spin-coated on top of a glass substrate that had been pretreated with an adhesion promoting agent (Micro Resist Technology mr-ASP1).…”
Section: Methodsmentioning
confidence: 99%
“…Master gratings were defi ned using a Leo 1530/Raith Elphy Plus system in an electron-beam resist (ZEON ZEP 520A), which was spin-coated on top of a silicon wafer. The electronbeam resist was developed using xylene at 23 ° C and the pattern (1 mm × 1 mm total area) was transferred into the silicon master using reactive ion etching (RIE) with a combination of SF 6 and CHF 3 gas (at a 1:1 ratio). The resulting master structures were transferred onto a silica substrate using UV-nanoimprint lithography by creating a perfl uoropolyether daughter stamp from the master structure and then using that as a mold for replicating the structures onto a photoresist (Micro Resist Technology UVCur06), spin-coated on top of a glass substrate that had been pretreated with an adhesion promoting agent (Micro Resist Technology mr-ASP1).…”
Section: Methodsmentioning
confidence: 99%
“…Organic nonlinear optical (NLO) materials are continuing to receive great interests due to their wide applications in laser technology , optical data storage and terahertz (THz) wave generation , etc . In the past decades, extensive efforts have been made to construct noncentrosymmetric (NCS) arrangement of molecules, which is indispensable for second‐order nonlinear optical crystals .…”
Section: Introductionmentioning
confidence: 99%
“…While a sub-micron PVA film might not totally suppress photo-oxidation of OS, it is still expected to slow down the process. The device was then annealed in air for three days at 35°C in order to totally evaporate the solvent and obtain a good crystalline cohesion [10].…”
Section: Encapsulated Lasermentioning
confidence: 99%
“…They also benefit from potential low production cost and toxicity while their 'soft matter' nature offers great processing flexibility, enabling for example a wide range of novel bendable and mechanically-tunable devices such as OS lasers [2][3][4][5][6][7][8]. Wavelength electrical-tuning of OS lasers has also been shown [9][10][11]. Consequently, research on easy-to-fabricate and potentially disposable OS lasers based on these materials is being keenly pursued [12].…”
Section: Introductionmentioning
confidence: 99%