2009
DOI: 10.1063/1.3268464
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Electrically interconnected assemblies of microscale device components by printing and molding

Abstract: This letter presents approaches for assembly and electrical interconnection of micro/nanoscale devices into functional systems with useful characteristics. Transfer printing techniques provide deterministic control over an assembly process that occurs prior to or simultaneously with a soft lithographic molding step that defines relief features in a receiving polymer. Filling these features with conducting materials that are processable in the form of liquids or pastes yields integrated interconnects and contac… Show more

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Cited by 8 publications
(7 citation statements)
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References 22 publications
(34 reference statements)
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“…Also, the bottom surfaces of the devices are passivated with thermal oxide, thereby minimizing any infl uence of the substrate on their performance. When implemented using foundry wafer fabrication facilities for the devices and advanced inkjet, [ 20 ] electrohydrodynamic, [ 21 , 22 ] direct-write, [ 23 ] or alternative printing techniques [ 24 ] for the interconnect, these procedures have the potential to bypass the need for any additional specialized processing technology for large-area electronics, or other nonwafer applications such as those that demand fl exible, stretchable, or curvilinear substrates.…”
Section: Discussionmentioning
confidence: 99%
“…Also, the bottom surfaces of the devices are passivated with thermal oxide, thereby minimizing any infl uence of the substrate on their performance. When implemented using foundry wafer fabrication facilities for the devices and advanced inkjet, [ 20 ] electrohydrodynamic, [ 21 , 22 ] direct-write, [ 23 ] or alternative printing techniques [ 24 ] for the interconnect, these procedures have the potential to bypass the need for any additional specialized processing technology for large-area electronics, or other nonwafer applications such as those that demand fl exible, stretchable, or curvilinear substrates.…”
Section: Discussionmentioning
confidence: 99%
“…Replica molding techniques enable such conductive elastomers to be patterned into geometries with feature sizes from the micron to centimeter range. Here, composite pastes of Ag and uncured PDMS fill into trenches defined by patterns of photoresist, similar to processes described previously . Measurements of electrical resistance of a patterned conductive trace (30 mm × 150 μm × 50 μm) embedded in an insulating elastomer under uniaxial stretching appear in Figure f.…”
mentioning
confidence: 95%
“…Fabrication of Scale Architectures with Edge Anchors : A photolithographically defined pattern of SU‐8 5 (15 μm thick, MicroChem Corp.) on a Si (100) wafer (Addison Engineering) provided rectangular openings (100 μm × 200 μm). Prepolymer to PDMS was poured and scraped over the functionalized (trichlorosilane, United Chemical Technology) surface of this wafer,25 to define the dimensions of edge anchors made of PDMS. Silicon scales were printed on the partially cured surface of the PDMS (60 °C for 30 min).…”
Section: Methodsmentioning
confidence: 99%