2005
DOI: 10.1063/1.1914954
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Electrical performance of contaminated rough surfaces in contact

Abstract: The inevitable presence of thin insulating films at the contact interface of electrical contacts has an adverse effect on their performances. An attempt is made to study the electrical performance of degraded electrical contacts where insulating films reside at the contact interface of conductive rough surfaces. The degradation mechanism is based on gradual growth of an insulating film and the characteristics of the insulating film are assumed to be known without considering details regarding the physical and … Show more

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Cited by 37 publications
(21 citation statements)
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“…Nevertheless, the results in Figure 8, which at a constant applied load, show that with an increased electrical current density, temperature, and rotating speed, the contact resistance decreases for all the tests, except for the tests at 80°C and 5000 or 10,000 RPM. The decrease in the contact resistance can also connect with an increase in the electrical conduction area, 25 and a decrease in the brush stiffness with an increase in the temperature. 12 At the same time, additional open circuits become closed circuits and increase the real contact area.…”
Section: Resultsmentioning
confidence: 99%
“…Nevertheless, the results in Figure 8, which at a constant applied load, show that with an increased electrical current density, temperature, and rotating speed, the contact resistance decreases for all the tests, except for the tests at 80°C and 5000 or 10,000 RPM. The decrease in the contact resistance can also connect with an increase in the electrical conduction area, 25 and a decrease in the brush stiffness with an increase in the temperature. 12 At the same time, additional open circuits become closed circuits and increase the real contact area.…”
Section: Resultsmentioning
confidence: 99%
“…[9] Two electric potentials of 0.1 and 0.5 V were used for comparison, and ε is 0.4 nm. It can be seen from Fig.…”
Section: A Comparative Analysis Among Various Adhesive Forcesmentioning
confidence: 99%
“…The crystalline parameter of NiO, the main oxide for the Au-Ni contact, is about 0.4 nm [17], so the thickness of oxide film is defined from 1 nm to 6 nm in the modeling. 6 nm is chosen as it was suggested that no tunnel effect could occur for the thickness larger than 5 nm [11].…”
Section: B Assumptions Of Insulating Filmmentioning
confidence: 99%
“…-If the film was damaged, the tunnel effect became very weak compared to that of an intact film, and the I-V curves kept Ohmic [11].…”
Section: Introductionmentioning
confidence: 99%
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