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2023
DOI: 10.48550/arxiv.2303.04960
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Electrical manipulation of a single electron spin in CMOS with micromagnet and spin-valley coupling

Abstract: For semiconductor spin qubits, complementary-metal-oxide-semiconductor (CMOS) technology is the ideal candidate for reliable and scalable fabrication. Making the direct leap from academic fabrication to qubits fabricated fully by industrial CMOS standards is difficult without intermediate solutions. With a flexible back-end-of-line (BEOL) new functionalities such as micromagnets or superconducting circuits can be added in a post-CMOS process to study the physics of these devices or achieve proof of concepts. O… Show more

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Cited by 2 publications
(3 citation statements)
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“…[148] Electrically driven resonance was demonstrated using inter-valley SOC-mediated spin-valley coupling, [149] but this method is valid only when the Zeeman splitting and valley splitting are close to crossover. Recently, by using a post-CMOS process to add a micromagnet on top of the device, the coherent manipulation of the qubit was achieved based on the synthetic SOC, but spin relaxation time coupling is reduced to 5.2 ms. [150] An enhancement of the Rabi frequency due to spin-valley mixing was also shown.…”
Section: Si Nanowire Fetmentioning
confidence: 89%
“…[148] Electrically driven resonance was demonstrated using inter-valley SOC-mediated spin-valley coupling, [149] but this method is valid only when the Zeeman splitting and valley splitting are close to crossover. Recently, by using a post-CMOS process to add a micromagnet on top of the device, the coherent manipulation of the qubit was achieved based on the synthetic SOC, but spin relaxation time coupling is reduced to 5.2 ms. [150] An enhancement of the Rabi frequency due to spin-valley mixing was also shown.…”
Section: Si Nanowire Fetmentioning
confidence: 89%
“…Figure 1(a) presents the gate defined double quantum dot (DQD) device fabricated on an isotopically purified 28 Si epilayer (with the residual 29 Si concentration of 60 ppm). Three overlapping layers of aluminum gates [30,36] with plasma enhanced oxidation [37] to ensure electrical isolation property are used to define the QD structure and single-electron-transistor (SET) structure.…”
Section: Device and Qubit State Readoutmentioning
confidence: 99%
“…[24][25][26] When the Zeeman splitting energy is comparable to E vs , the electron spin state and valley state will mix, achieving a significantly enhanced Rabi frequency at this spinvalley hotspot. [27,28] However, the spin state relaxation rate is also enhanced at spin-valley hotspot. [20,29,30] Additionally, due to the presence of valleys, the EDSR signal of a single electron spin qubit in a QD may be more complex than that suggested by the simple two-level Hamiltonian.…”
Section: Introductionmentioning
confidence: 99%