2016
DOI: 10.1063/1.4947285
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Electrical limit of silver nanowire electrodes: Direct measurement of the nanowire junction resistance

Abstract: We measure basic network parameters of silver nanowire (AgNW) networks commonly used as transparent conducting electrodes in organic optoelectronic devices. By means of four point probing with nanoprobes, the wire-to-wire junction resistance and the resistance of single nanowires are measured. The resistance RNW of a single nanowire shows a value of RNW=(4.96±0.18) Ω/μm. The junction resistance RJ differs for annealed and non-annealed NW networks, exhibiting values of RJ=(25.2±1.9) Ω (annealed) and RJ=(529±239… Show more

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Cited by 47 publications
(32 citation statements)
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“…For AgNWs, the sheet resistance of a AgNW network arises mainly from the contact resistance between NWs. The wire–wire junction resistance, which can be as large as 1 GΩ, is due to thin insulating PVP coating on the surface of AgNWs . It is therefore critical to minimize contact resistance between NWs in order to lower the sheet resistance of a NW network.…”
Section: Post‐printing Treatmentmentioning
confidence: 99%
“…For AgNWs, the sheet resistance of a AgNW network arises mainly from the contact resistance between NWs. The wire–wire junction resistance, which can be as large as 1 GΩ, is due to thin insulating PVP coating on the surface of AgNWs . It is therefore critical to minimize contact resistance between NWs in order to lower the sheet resistance of a NW network.…”
Section: Post‐printing Treatmentmentioning
confidence: 99%
“…[22][23][24][25] As a general design rule, the wire geometry and the aspect ratio are prominent parameters that govern the electrical and optical properties of the resulting network electrodes. 26 These parameters also contribute to the fundamental limits of conductivity and transmittance that can be achieved with a given wire geometry. In addition, the junction resistance between two wires in the network is of paramount importance.…”
Section: General Considerationsmentioning
confidence: 99%
“…In addition, the junction resistance between two wires in the network is of paramount importance. 26,27 It has to be noted that dispersing agents like organic polymers or small molecules assembled around the wires may signicantly increase the contact resistance and therefore lead to an overall elevated sheet resistance of the as-deposited NW networks. A range of post-deposition treatments to reduce the junction resistance has been discussed.…”
Section: General Considerationsmentioning
confidence: 99%
“…The contact resistance between two AgNWs reaches 529 ± 239 , whereas the resistance within one AgNW is only about 5 /μm [22]. This high contact resistance dominantly affects the overall electrical performance of the resulting random network electrodes because the electrons in a percolation network are transported through the inter-nanowire junctions.…”
Section: Ag Nanowiresmentioning
confidence: 99%