Electrical Failure Analysis Methodology for DRAM of 80nm era and beyond using Nanoprober Technique

Park, Soo Young; Han, Sangyeon; Lee, Wonseok; Jeon, Chang Wan; Sohn, Si-Ok; Chae, Kwon Seok; Yamada, S.; Yang, Wonyoung; Park, Donggun

doi:10.1109/icmts.2007.374454

Cited by 2 publications

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Among the applications permitted by this unique capability, it has become standard for the semiconductor industry to evaluate the performance of integrated circuitries (IC) via nanoprobing under electron microscopy imaging [1]. Nanoprobing inside SEM allows needle probes to be precisely positioned on top of sub-micrometer-sized electrodes for direct electrical characterization, which is important for failure analysis, quality control, and process development for the semiconductor industry [2] [3].…”

Section: Introductionmentioning

confidence: 99%

Automated nanoprobing under scanning electron microscopy

Gong

Chen

Liu

et al. 2013

2013 IEEE International Conference on Robotics and Automation

View full text Add to dashboard Cite

Nanomanipulation inside electron microscopes enables a multitude of precision applications. The semiconductor industry employs this capability to probe sub-micrometer-sized features to evaluate the performance of integrated circuits (IC) for design/quality monitoring. In electron microscopy imaging, the use of low accelerating voltages and high magnifications, as required for IC nanoprobing tasks, results in significant image noise and drift. This paper presents automated nanoprobing with a nanomanipulation system inside a standard scanning electron microscope (SEM). We achieved SEM image denoising and drift compensation in real time. This capability is necessary for achieving robust visual tracking and servo control of nanoprobes for probing nanostructures in automated operation. This capability also proves highly useful to conventional manual operation by rendering real-time SEM images that have little noise and drift. The automated system probed nanostructures on an SEM metrology chip as surrogates of electronic features on IC chips. Success rates in visual tracking and Z-contact detection under various imaging conditions were quantitatively discussed. The experimental results demonstrate the system's capability for automated probing of nanostructures under ICchip-probing relevant EM imaging conditions.

show abstract

Section: Introductionmentioning

confidence: 99%