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2007
DOI: 10.1016/j.tsf.2007.06.064
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Electrical conduction mechanism in laser deposited amorphous carbon

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Cited by 19 publications
(22 citation statements)
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“…[26] This value is within those predicted on the Poole-Frenkel model. [27][28][29] The difference in the carrier types between previous reports on a-CN x and that presented in this study was explained by the different conduction mechanism attributed to the charge conduction which was heavily influenced by the band structure. This is based on the fact that nitrogen modifications to the band structure occur mainly close to the Fermi level.…”
Section: Introductioncontrasting
confidence: 61%
See 3 more Smart Citations
“…[26] This value is within those predicted on the Poole-Frenkel model. [27][28][29] The difference in the carrier types between previous reports on a-CN x and that presented in this study was explained by the different conduction mechanism attributed to the charge conduction which was heavily influenced by the band structure. This is based on the fact that nitrogen modifications to the band structure occur mainly close to the Fermi level.…”
Section: Introductioncontrasting
confidence: 61%
“…(see Figure 3(c)) A shorter bandtail observed in a-CN x films, and the sharp peak in the DOS at approximately 1.5 eV for a-C could be attributed to the stress induced localized states as shown in Figure 3(c) [29].…”
Section: Discussionmentioning
confidence: 84%
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“…Pulsed laser deposition (PLD) is another technique that may be used to produce multi-element thin films [13][14][15]; here, multi-component nanostructures may be formed by simultaneous ablation of multiple targets and/or ablation of a composite target. Despite assertions that ablation of a composite target results in stoichiometric deposition [16], there have also been reported cases of non-stoichiometric thin film deposition [15,17].…”
Section: Introductionmentioning
confidence: 99%