2008
DOI: 10.1063/1.2920206
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Electrical characterization of carbon nanotube field-effect transistors with SiNx passivation films deposited by catalytic chemical vapor deposition

Abstract: SiN x passivation films were deposited on carbon nanotube field-effect transistors (CNTFETs) by catalytic chemical vapor deposition (Cat-CVD) at low substrate temperatures. Deposition at 330°C induced many defects in the CNT channels. The measurement of electrical properties revealed that p-type CNTFETs were converted to n-type CNTFETs after deposition at 270°C. Air-stable p-type top-gated CNTFETs with SiNx passivation films deposited at 65°C were operated. Thus, Cat-CVD is highly suitable for depositing high-… Show more

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Cited by 48 publications
(36 citation statements)
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“…CNTFETs were fabricated using position-controlled growth [44,45], as shown in [46], as shown in Figure 3b. Source and drain contacts were formed on the patterned chemical catalyst after the CNT growth, and the substrate was used as a back gate, as shown in Fig.…”
Section: Fabrication Process Of Carbon Nanotube Devicesmentioning
confidence: 99%
“…CNTFETs were fabricated using position-controlled growth [44,45], as shown in [46], as shown in Figure 3b. Source and drain contacts were formed on the patterned chemical catalyst after the CNT growth, and the substrate was used as a back gate, as shown in Fig.…”
Section: Fabrication Process Of Carbon Nanotube Devicesmentioning
confidence: 99%
“…Many applications have been proposed such as nano-size transistors, bio sensors, and interconnections in large-scale circuits. Several technologies can be utilized in these applications, such as high-sensitive gas sensors [3], label-free detection for bio molecules [4,5], and n-type field effect transistor (FET) fabrication [6,7]. The room temperature operation of single electron transistors, which can usually work only at low temperature, can be archived through the use of nanotechnology [8,9].…”
Section: Introductionmentioning
confidence: 99%
“…Thus, the FET structures and nano-processes of nano carbon materials should be important for applications. The carrier control of p-type and n-type conduction is also possible using a passivation layer [4,5]. Furthermore, a single electron or hole transistor as a nano-sized device has been fabricated using nanotechnology [6], which has exhibited room-temperature operation [7].…”
Section: Introductionmentioning
confidence: 99%