1983
DOI: 10.1016/0042-207x(83)90009-x
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Electrical and photoconducting properties of CdS (Cu, Cl) thin films

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Cited by 8 publications
(3 citation statements)
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“…The In 2 O 3 (Sn) layer was made by reactive ionic sputtering in a diode circuit in an oxygen atmosphere, and on this layer the photoconducting CdS layer [6] was then evaporated under vacuum. Next the CdS layer was recrystallized by its annealing in CdS powder with Cu 2þ and Cl À ions.…”
Section: Investigation Resultsmentioning
confidence: 99%
“…The In 2 O 3 (Sn) layer was made by reactive ionic sputtering in a diode circuit in an oxygen atmosphere, and on this layer the photoconducting CdS layer [6] was then evaporated under vacuum. Next the CdS layer was recrystallized by its annealing in CdS powder with Cu 2þ and Cl À ions.…”
Section: Investigation Resultsmentioning
confidence: 99%
“…a -immediately after formation, b -after 1000 hours.. (8) As can be seen, for the film examined immediately after formation the dependence of the photoconductance on the illuminance is linear over the whole range investigated (0 -200 lx). In contrast , for the film aged for 1000 hours this dependence is linear only to about 30…”
Section: -'mentioning
confidence: 89%
“…The 1n203(Sn) layer was made by reactive cathode sputtering of a 90 % In -10 % Sn alloy in a diode circuit in oxygen atmosphere, and on this layer the photoconductive CdS layer was then evaporated undcr vacuuim. Next the CdS layer was recrystallized by its annea*ling in CdS powder with Cu2+ and Cl-ions[8]. The second electrode of the PC element was an indium layer evaporated under vacuum on a photoconductive CdS(Cu,CI) layer.…”
mentioning
confidence: 99%