2012
DOI: 10.1088/0022-3727/45/19/195104
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Electrical and optical properties of point defects in ZnO thin films

Abstract: We show that the deposition of ZnO films under varying oxygen partial pressure and annealing conditions allows for the controllable formation of specific defects. Using x-ray diffraction and photoluminescence, we characterize the defects formed and show that these defects are responsible for changes in film carrier density, carrier type, sheet resistivity and mobility.

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Cited by 78 publications
(39 citation statements)
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“…The origin of the NMR could be due to the Anderson-localization [35], carrier concentration change due to energy level splitting in a band [36], mobility change due to energy level variation [36], variable hopping-length hopping probability change [37,38], etc. The observed results assign the point defects, which were proven for pure ZnO thin films in the previous study [39]. In addition to Zn and O dependent point defects, W dependent defects, interstitial W atoms (W_ I ) and substituted W atoms (W Zn ) in W þ 6 , W þ 5 and W þ 4 ionic states, cannot be excluded for W doped ZnO thin films.…”
Section: Resultssupporting
confidence: 62%
“…The origin of the NMR could be due to the Anderson-localization [35], carrier concentration change due to energy level splitting in a band [36], mobility change due to energy level variation [36], variable hopping-length hopping probability change [37,38], etc. The observed results assign the point defects, which were proven for pure ZnO thin films in the previous study [39]. In addition to Zn and O dependent point defects, W dependent defects, interstitial W atoms (W_ I ) and substituted W atoms (W Zn ) in W þ 6 , W þ 5 and W þ 4 ionic states, cannot be excluded for W doped ZnO thin films.…”
Section: Resultssupporting
confidence: 62%
“…During the depositions, the sample holder temperature was kept at 420 6 1°C. This specific gas concentration was the optimal condition of pure ZnO growth in our earlier work, 26 where we varied the partial pressures from 0:100 to 50:50 percent. Furthermore, this concentration is optimal to eliminate the formation of metallic Zn clusters and obtain large grain sizes with the preferred orientations.…”
Section: Methodsmentioning
confidence: 99%
“…[18][19][20][21][22] Coey et al 22 emphasized the magnetic formation without magnetic ions in both d 0 systems and other oxides with crystal defects.The point defects also determine the electrical and optical properties of ZnO thin films. [23][24][25][26][27][28] Furthermore, the point defect density of ZnO is studied for the optical performance, 29 photoelectrode application for the solar cells, 30 carrier relaxation dynamics, 31 gas sensing, 32 and fluorescent properties for biomedical applications. 33 The defects are seen as the main control mechanism of physical properties of ZnO.…”
Section: Introductionmentioning
confidence: 99%
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“…Combination of Zn vacancy (V Zn ) (deep acceptor level) with Zn interstitial (Zn i ) (shallow donor level), which also has transition energy in green spectral range, is less probable because these defects would be accompanied also by emission in the blue range (400e450 nm), which is missing in the ZnO(1) spectrum. Red to orange luminescence of samples ZnO(2) and ZnO (3) is probably caused by oxygen vacancy (V O ), which forms very deep donor levels [43]. Oxygen vacancies are more probable on the particle surface and grain boundaries [25,44], that is why higher concentration of these defects in samples ZnO(2) and ZnO(3) with smaller particle size and higher specific surface area was observed.…”
Section: Photocatalysts Preparation and Characterizationmentioning
confidence: 99%