2020
DOI: 10.1007/s10853-019-04278-x
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Electrical and optical properties of titanium oxynitride thin films

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Cited by 38 publications
(29 citation statements)
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“…The nitrogen deficiency could be attributed to incomplete nitridation of the coating due to the predominance of nitrogen out-diffusion over nitrogen in-diffusion at elevated temperatures [41,42]. Besides evidence of TiN oxidation reported in the literature [35,36,38,39], the evidence in favor of TiN oxidation process has been obtained by our group too using x-ray photoelectron spectroscopy and has been published separately [43]. The corrosion protective nature of TiN coatings was further analyzed by the EIS study.…”
Section: Potentiodynamic Polarization and Electrochemical Impedance Smentioning
confidence: 82%
“…The nitrogen deficiency could be attributed to incomplete nitridation of the coating due to the predominance of nitrogen out-diffusion over nitrogen in-diffusion at elevated temperatures [41,42]. Besides evidence of TiN oxidation reported in the literature [35,36,38,39], the evidence in favor of TiN oxidation process has been obtained by our group too using x-ray photoelectron spectroscopy and has been published separately [43]. The corrosion protective nature of TiN coatings was further analyzed by the EIS study.…”
Section: Potentiodynamic Polarization and Electrochemical Impedance Smentioning
confidence: 82%
“…TiON nanoparticles present promising nanoadditives for electrode materials due to their conductivity, chemical resistance, and high surface area [ 23 , 24 , 25 , 26 , 27 , 28 ]. To test our TiON nanoparticles, we incorporate them into a carbon-fiber-nonwoven (CFN).…”
Section: Resultsmentioning
confidence: 99%
“…When immobilized on carbon nanotubes, the TiON composite materials can be used as electrodes for supercapacitors, where the capacity increases by a factor of 5 versus pristine carbon nanotube electrodes and by a factor of 2 compared to titanium oxide carbon/nanotube composites [ 9 ]. This example shows that TiON nanoparticles are capable of boosting the surface area as well as the conductivity, producing high-performance electrodes for energy storage applications [ 10 , 23 , 25 , 26 , 27 , 28 ].…”
Section: Introductionmentioning
confidence: 99%
“…12−17 Although some work has been done on Cu-doped TiN and oxygen diffusion in Cu/TiN/Al, no in-depth experimental studies of Cu-doped TiN x O y films' physical properties have been published to the best of our knowledge. 18,19 Magnetron sputtering, 2,20,21 reactive sputtering, 22−24 pulsed laser deposition, 25 and atomic layer deposition (ALD) are the major technologies to produce TiN x O y thin films as they do not require elevated temperatures while providing good conformity. 6,26,27 The self-limiting nature of the ALD growth and the ability to grow on the shaded and even upside-down surfaces make this technology more favorable for certain applications.…”
Section: ■ Introductionmentioning
confidence: 99%