2013
DOI: 10.1134/s1063784213090132
|View full text |Cite
|
Sign up to set email alerts
|

Electrical and magnetic performance of multilayer structures based on (Co40Fe40B20)33.9(SiO2)66.1 composite

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
7
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 17 publications
(7 citation statements)
references
References 4 publications
0
7
0
Order By: Relevance
“…All peculiarities of the sputtering method, choice of components and control of the sample parameters are described in Refs. [19,14,20,16].…”
Section: Samplesmentioning
confidence: 99%
See 2 more Smart Citations
“…All peculiarities of the sputtering method, choice of components and control of the sample parameters are described in Refs. [19,14,20,16].…”
Section: Samplesmentioning
confidence: 99%
“…At the same time, SC layers are chemically homogeneous, and their morphology is determined only by their thickness and roughness. Recently it was shown that the conductive and magnetic properties of MI / SC nanostructures are determined both by the composition and morphology of MI [14] and SC layers [15,16,17]. Some of the recent works were aimed to study an indirect coupling between the nanoparticles in MI layers through semiconducting interlayers.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…These systems have found practical application in devices of information storage. It is well known [2] that, in the area of high frequencies, the use of nanostructures becomes more complicated due to the increase of losses caused by eddies currents as the frequency increases, so just the use of nanocomposites at concentrations close to the percolation threshold minimize these losses.…”
Section: Introductionmentioning
confidence: 99%
“…Nanomaterials are so attractive that their production technologies are systematically enhanced. In-depth recognition of ion technologies and more specifically of the ion-beam sputtering [3][4][5][6] or ion implantation [7][8][9] and of magnetron sputtering [10][11][12] as well as of the plasma and hightemperature techniques [13][14][15][16][17] makes it possible to produce multi-component nanomaterial structures. From a big amount of chemical methods for the production of thin films it is the sol-gel method and chemical deposition techniques that meet the greatest scientific interest [18][19][20].…”
Section: Introductionmentioning
confidence: 99%